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Transmission electron microscopy characterization of low temperature boron doped silicon epitaxial films

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https://hal.archives-ouvertes.fr/hal-03030275
Contributor : Pere Roca I Cabarrocas <>
Submitted on : Monday, December 14, 2020 - 7:02:57 PM
Last modification on : Tuesday, February 16, 2021 - 3:11:55 AM

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Guillaume Noircler, Marta Chrostowski, Melvyn Larranaga, Etienne Drahi, Pere Roca I Cabarrocas, et al.. Transmission electron microscopy characterization of low temperature boron doped silicon epitaxial films. CrystEngComm, Royal Society of Chemistry, 2020, 22 (33), pp.5464-5472. ⟨10.1039/D0CE00817F⟩. ⟨hal-03030275⟩

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