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Approche holistique du contrôle du focus en photolithographie 193nm immersion pour les niveaux critiques en 28nm et 14nm FD-SOI

Abstract : The increasing complexity in chip integration and the race to dimension shrinkage are the two main drivers of microelectronics today. The optical limitations of lithography have been reached some years. Because of these, the manufacturing itself needs to be more tightly controlled in order to avoid marginalities. Which will affect the chip operation. This thesis presents a holistic approach of the control of one of the main parameters for photolithography: focus. It is directly linked to the quality of the image transferred into the photoresist during exposure. Its control is then essential. Variability sources for focus are manifold and diverse but this work focuses on the topography of the substate. The holistic approach of topology leaded to the use of data mining tooling as partial least square regression. It allowed the highlighting of main causes of topography, the creation of a predictive model of topology and the evaluation of several improvement solutions. Scanner levelling improvements which might be effective for every technology without any modification to make on integration and design. The emulated wafer map methodology providing on-product focus non-uniformities without any measurements is also a solution for investigation. Solutions to mitigate the risk factors by modifying the design topography built-up main factors were also envisioned.
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https://hal-ujm.archives-ouvertes.fr/tel-01419388
Contributor : Jean-Gabriel Simiz Connect in order to contact the contributor
Submitted on : Monday, December 19, 2016 - 1:05:18 PM
Last modification on : Monday, January 13, 2020 - 5:46:06 PM
Long-term archiving on: : Tuesday, March 28, 2017 - 12:33:10 AM

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  • HAL Id : tel-01419388, version 1

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Jean-Gabriel Simiz. Approche holistique du contrôle du focus en photolithographie 193nm immersion pour les niveaux critiques en 28nm et 14nm FD-SOI. Micro et nanotechnologies/Microélectronique. Université de Lyon, 2016. Français. ⟨tel-01419388v1⟩

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