Transient response of dielectric materials exposed to ultrafast laser irradiation

Sebastian W. Winkler 1 Igor M. Burakov 2 Razvan Stoian 1, 3, * Nadezhda M. Bulgakova 2 Anton Husakou 1 Alexandre Mermillod-Blondin 1, 3 Arkadi Rosenfeld 1 David Ashkenasi 4 Ingolf V. Hertel 1
* Corresponding author
1 MBI - Max-Born-Institut für Nichtlineare Optik und Kurzzeitspektroskopie
2 ITP - Institute of Thermophysics
3 LHC - Laboratoire Hubert Curien [Saint Etienne]
4 LMTB - Laser- und Medizin-Technologie GmbH
Abstract : We present results describing several characteristics of energy coupling into fused silica dielectric materials irradiated by ultrashort laser pulses in a regime close to the surface optical breakdown threshold. The results intend to illustrate the energy balance in the interaction process by observing the spatio-temporal variations of a laser pulse transversing a dielectric slab as a function of its energy. The measurements are based on real-time observations of the self-action of the laser pulse and associated effects on its temporal envelope, as well as on ex-situ phase-contrast microscopy of induced permanent material reactions. The experimental results are accompanied by numerical simulations of the pulse traces inside the dielectric material at different energetic conditions. The optical observations allow insights into the development and the dynamics of the laser-induced free carrier population, emphasizing the role of the bulk effects related to the nonlinear wave propagation into the transparent material during laser exposure.
keyword : ultrafast laser excitation dielectric materials
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Journal articles
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https://hal-ujm.archives-ouvertes.fr/ujm-00117493
Contributor : Razvan Stoian <>
Submitted on : Friday, December 1, 2006 - 7:42:36 PM
Last modification on : Wednesday, July 25, 2018 - 2:05:30 PM

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Sebastian W. Winkler, Igor M. Burakov, Razvan Stoian, Nadezhda M. Bulgakova, Anton Husakou, et al.. Transient response of dielectric materials exposed to ultrafast laser irradiation. Applied physics. A, Materials science & processing, Springer Verlag, 2006, 84 (4), pp.413. ⟨10.1007/s00339-006-3644-7⟩. ⟨ujm-00117493⟩

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