Service interruption on Monday 11 July from 12:30 to 13:00: all the sites of the CCSD (HAL, Epiciences, SciencesConf, AureHAL) will be inaccessible (network hardware connection).
Skip to Main content Skip to Navigation
Journal articles

A monolithic optical phase-shift detector on silicon

Abstract : A novel monolithically integrated device used as an optical phase-shift detector is presented. It consists of a diffraction grating etched at the surface of a p-n photodiode fabricated by a process compatible with a standard silicon CMOS technology. When two coherent light beams are collimated toward the surface of the device, the detected optical power generates a current depending on the relative phase between the two incident beams. The operating principle of this detector and the results obtained by finite-difference time-domain modeling are presented. The fabrication process of the first devices is described and the experimental validation of the concept is demonstrated
Document type :
Journal articles
Complete list of metadata
Contributor : Nathalie Destouches Connect in order to contact the contributor
Submitted on : Friday, January 5, 2007 - 3:31:39 PM
Last modification on : Monday, July 4, 2022 - 10:14:59 AM



Philippe Arguel, Jérôme Valentin, S. Fourment, Françoise Lozes-Dupuy, Gérard Sarrabayrouse, et al.. A monolithic optical phase-shift detector on silicon. IEEE Sensors Journal, Institute of Electrical and Electronics Engineers, 2005, 5, pp.1305-1309. ⟨10.1109/JSEN.2005.858945⟩. ⟨ujm-00122906⟩



Record views