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Design and fabrication of an all-dielectric grating with top-hat high diffraction efficiency over a broad spectral range

Nikolay Lyndin 1 Manuel Flury 1 Svetlen Tonchev 1 Renate Fechner 2 Olivier Parriaux 1
1 LHC - Laboratoire Hubert Curien [Saint Etienne]
2 IOM - Institut für Oberflächenmodifizierung
Abstract : Between 98% and 100% flat top efficiency –1st order TE diffraction over a 40 nm wavelength range centered at 800 nm can be obtained by an all-dielectric grating structure where the corrugation is etched in a high index layer unlike in the state of the art. 98% maximum efficiency and a wide-band top-hat diffraction efficiency spectrum are demonstrated experimentally.
Keywords : femtosecond laser compression gratings dielectric multilayer leaky mode
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Journal articles
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https://hal-ujm.archives-ouvertes.fr/ujm-00161511
Contributor : Manuel Flury <>
Submitted on : Tuesday, July 10, 2007 - 6:59:55 PM
Last modification on : Tuesday, June 16, 2020 - 12:56:02 PM

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UNIV-ST-ETIENNE | LAHC | CNRS | IOGS | PARISTECH | UDL

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Nikolay Lyndin, Manuel Flury, Svetlen Tonchev, Renate Fechner, Olivier Parriaux. Design and fabrication of an all-dielectric grating with top-hat high diffraction efficiency over a broad spectral range. Journal of European Optical Society - Rapid Publications, 2007, 2 (07019), pp.1-5. ⟨10.2971/jeos.2007.07019⟩. ⟨ujm-00161511⟩

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