TEM analysis of ion plated HfO2/SiO2 multilayers for femtosecond lasers

Manuel Flury; Gilles Patriache; David Troadec; Olivier Parriaux

Conference Papers Year : 2008

TEM analysis of ion plated HfO2/SiO2 multilayers for femtosecond lasers

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Manuel Flury

Function : Author
PersonId : 749517
IdHAL : manuel-flury
ORCID : 0000-0002-1878-884X
IdRef : 07597827X

Laboratoire Hubert Curien

Gilles Patriache

Function : Author

Laboratoire de photonique et de nanostructures

David Troadec

Function : Author
PersonId : 745527
IdHAL : david-troadec
IdRef : 059727403

Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520

Olivier Parriaux

Function : Author

Laboratoire Hubert Curien

Domains

Optics / Photonic

Manuel Flury : Connect in order to contact the contributor

https://hal-ujm.archives-ouvertes.fr/ujm-00290782

Submitted on : Thursday, June 26, 2008-2:38:13 PM

Last modification on : Friday, March 24, 2023-2:52:50 PM

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ujm-00290782 , version 1 (26-06-2008)

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HAL Id : ujm-00290782 , version 1

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Manuel Flury, Gilles Patriache, David Troadec, Olivier Parriaux. TEM analysis of ion plated HfO2/SiO2 multilayers for femtosecond lasers. 7th Symposium SiO2, advanced dielectrics and related devices, Jul 2008, Saint-Etienne, France. ⟨ujm-00290782⟩

TEM analysis of ion plated HfO2/SiO2 multilayers for femtosecond lasers

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