TEM analysis of ion plated HfO2/SiO2 multilayers for femtosecond lasers

Manuel Flury 1 Gilles Patriache 2 David Troadec 3 Olivier Parriaux 1
1 LHC - Laboratoire Hubert Curien [Saint Etienne]
2 LPN - Laboratoire de photonique et de nanostructures
3 IEMN - Institut d’Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520
Document type :
Conference papers
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https://hal-ujm.archives-ouvertes.fr/ujm-00290782
Contributor : Manuel Flury <>
Submitted on : Thursday, June 26, 2008 - 2:38:13 PM
Last modification on : Thursday, October 18, 2018 - 1:23:49 AM

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  • HAL Id : ujm-00290782, version 1

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UNIV-ST-ETIENNE | LAHC | UNIV-LILLE | IOGS | PARISTECH | UNIV-VALENCIENNES

Citation

Manuel Flury, Gilles Patriache, David Troadec, Olivier Parriaux. TEM analysis of ion plated HfO2/SiO2 multilayers for femtosecond lasers. 7th Symposium SiO2, advanced dielectrics and related devices, Jul 2008, France. p. ⟨ujm-00290782⟩

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