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TEM analysis of ion plated HfO2/SiO2 multilayers for femtosecond lasers

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https://hal-ujm.archives-ouvertes.fr/ujm-00290782
Contributor : Manuel Flury <>
Submitted on : Thursday, June 26, 2008 - 2:38:13 PM
Last modification on : Monday, March 2, 2020 - 1:38:04 PM

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  • HAL Id : ujm-00290782, version 1

Citation

Manuel Flury, Gilles Patriache, David Troadec, Olivier Parriaux. TEM analysis of ion plated HfO2/SiO2 multilayers for femtosecond lasers. 7th Symposium SiO2, advanced dielectrics and related devices, Jul 2008, France. p. ⟨ujm-00290782⟩

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