TEM analysis of ion plated HfO2/SiO2 multilayers for femtosecond lasers - Archive ouverte HAL Access content directly
Conference Papers Year : 2008

TEM analysis of ion plated HfO2/SiO2 multilayers for femtosecond lasers

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ujm-00290782 , version 1 (26-06-2008)

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  • HAL Id : ujm-00290782 , version 1

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Manuel Flury, Gilles Patriache, David Troadec, Olivier Parriaux. TEM analysis of ion plated HfO2/SiO2 multilayers for femtosecond lasers. 7th Symposium SiO2, advanced dielectrics and related devices, Jul 2008, Saint-Etienne, France. ⟨ujm-00290782⟩
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