Electrical Properties within 70-300 Kof Boron containing DLC Filmsdeposited by femtosecond Pulsed Laser Ablation

Aurélien Sikora 1 Alexandre Berkesse Olivier Bourgeois 2 Jean-Luc Garden 3 Christelle Guerret-Piécourt 4 A.-S. Loir 1 Florence Garrelie 1 Christophe Donnet 1
1 LHC - Laboratoire Hubert Curien [Saint Etienne]
2 TPS - Thermodynamique et biophysique des petits systèmes
NEEL - Institut Néel
3 CapTher - Capteurs thermométriques et calorimétrie
NEEL - Institut Néel
4 LTDS - Laboratoire de Tribologie et Dynamique des Systèmes
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Conference papers
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https://hal-ujm.archives-ouvertes.fr/ujm-00356328
Contributor : Florence Garrelie <>
Submitted on : Tuesday, January 27, 2009 - 11:41:31 AM
Last modification on : Wednesday, February 13, 2019 - 10:06:08 AM

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  • HAL Id : ujm-00356328, version 1

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Aurélien Sikora, Alexandre Berkesse, Olivier Bourgeois, Jean-Luc Garden, Christelle Guerret-Piécourt, et al.. Electrical Properties within 70-300 Kof Boron containing DLC Filmsdeposited by femtosecond Pulsed Laser Ablation. ICMCTF 2008, International Conference on Metallurgical Coatings and Thin Films, May 2008, San Diego, United States. ⟨ujm-00356328⟩

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