Electrical Properties within 70-300 Kof Boron containing DLC Filmsdeposited by femtosecond Pulsed Laser Ablation - Archive ouverte HAL Access content directly
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Electrical Properties within 70-300 Kof Boron containing DLC Filmsdeposited by femtosecond Pulsed Laser Ablation

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ujm-00356328 , version 1 (27-01-2009)

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  • HAL Id : ujm-00356328 , version 1

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Aurélien Sikora, Alexandre Berkesse, Olivier Bourgeois, Jean-Luc Garden, Christelle Guerret-Piécourt, et al.. Electrical Properties within 70-300 Kof Boron containing DLC Filmsdeposited by femtosecond Pulsed Laser Ablation. ICMCTF 2008, International Conference on Metallurgical Coatings and Thin Films, May 2008, San Diego, United States. ⟨ujm-00356328⟩
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