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Electrical Properties within 70-300 Kof Boron containing DLC Filmsdeposited by femtosecond Pulsed Laser Ablation

Aurélien Sikora 1 Alexandre Berkesse Olivier Bourgeois 2 Jean-Luc Garden 3 Christelle Guerret-Piécourt 4 A.-S. Loir 1 Florence Garrelie 1 Christophe Donnet 1 
1 LHC - Laboratoire Hubert Curien [Saint Etienne]
2 TPS - Thermodynamique et biophysique des petits systèmes
NEEL - Institut Néel
3 ThEMA - Thermique Elaboration Matériaux Applications
NEEL - Institut Néel
4 LTDS - Laboratoire de Tribologie et Dynamique des Systèmes
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https://hal-ujm.archives-ouvertes.fr/ujm-00356328
Contributor : Florence Garrelie Connect in order to contact the contributor
Submitted on : Tuesday, January 27, 2009 - 11:41:31 AM
Last modification on : Sunday, June 26, 2022 - 2:02:02 AM

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  • HAL Id : ujm-00356328, version 1

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Aurélien Sikora, Alexandre Berkesse, Olivier Bourgeois, Jean-Luc Garden, Christelle Guerret-Piécourt, et al.. Electrical Properties within 70-300 Kof Boron containing DLC Filmsdeposited by femtosecond Pulsed Laser Ablation. ICMCTF 2008, International Conference on Metallurgical Coatings and Thin Films, May 2008, San Diego, United States. ⟨ujm-00356328⟩

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