Electrical Properties within 70-300 Kof Boron containing DLC Filmsdeposited by femtosecond Pulsed Laser Ablation

Aurélien Sikora (1) , Alexandre Berkesse , Olivier Bourgeois (2) , Jean-Luc Garden (3) , Christelle Guerret-Piécourt (4) , A.-S. Loir (1) , Florence Garrelie (1) , Christophe Donnet (1)

1 LHC - Laboratoire Hubert Curien [Saint Etienne]
2 NEEL - TPS - Thermodynamique et biophysique des petits systèmes
3 NEEL - ThEMA - Thermique Elaboration Matériaux Applications
4 LTDS - Laboratoire de Tribologie et Dynamique des Systèmes

Domains: Engineering Sciences [physics]; Optics / Photonic

Aurélien Sikora, Alexandre Berkesse, Olivier Bourgeois, Jean-Luc Garden, Christelle Guerret-Piécourt, et al.. Electrical Properties within 70-300 Kof Boron containing DLC Filmsdeposited by femtosecond Pulsed Laser Ablation. ICMCTF 2008, International Conference on Metallurgical Coatings and Thin Films, May 2008, San Diego, United States. ⟨ujm-00356328⟩