Journal Articles
Thin Solid Films
Year : 2001
Jean-Pierre Chatelon : Connect in order to contact the contributor
https://hal-ujm.archives-ouvertes.fr/ujm-00356485
Submitted on : Tuesday, January 27, 2009-3:45:56 PM
Last modification on : Saturday, March 18, 2023-3:51:48 AM
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- HAL Id : ujm-00356485 , version 1
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Christian Gautier, G. Moulard, Jean-Pierre Chatelon, G. Motyl. Influence of substrate bias voltage on the in situ stress measured by an improved optical cantilever technique of sputtered chromium films. Thin Solid Films, 2001, 384, pp.102-108. ⟨ujm-00356485⟩
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