Influence of substrate bias voltage on the in situ stress measured by an improved optical cantilever technique of sputtered chromium films

Christian Gautier; G. Moulard; Jean-Pierre Chatelon; G. Motyl

Influence of substrate bias voltage on the in situ stress measured by an improved optical cantilever technique of sputtered chromium films

Christian Gautier G. Moulard Jean-Pierre Chatelon ¹ G. Motyl

1 DIOM - Dispositifs et Instrumentation en Optoélectronique et micro-ondes

Document type :

Journal articles

Domain :

Engineering Sciences [physics] / Micro and nanotechnologies/Microelectronics

Complete list of metadatas

https://hal-ujm.archives-ouvertes.fr/ujm-00356485
Contributor : Jean-Pierre Chatelon <>
Submitted on : Tuesday, January 27, 2009 - 3:45:56 PM
Last modification on : Sunday, October 15, 2017 - 10:44:04 PM

Influence of substrate bias voltage on the in situ stress measured by an improved optical cantilever technique of sputtered chromium films

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Influence of substrate bias voltage on the in situ stress measured by an improved optical cantilever technique of sputtered chromium films

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