Skip to Main content Skip to Navigation
Journal articles

Influence of substrate bias voltage on the in situ stress measured by an improved optical cantilever technique of sputtered chromium films

Christian Gautier G. Moulard Jean-Pierre Chatelon 1 G. Motyl
1 DIOM - Dispositifs et Instrumentation en Optoélectronique et micro-ondes
Document type :
Journal articles
Complete list of metadata
https://hal-ujm.archives-ouvertes.fr/ujm-00356485
Contributor : Jean-Pierre Chatelon <>
Submitted on : Tuesday, January 27, 2009 - 3:45:56 PM
Last modification on : Tuesday, November 19, 2019 - 2:37:05 AM

Identifiers

  • HAL Id : ujm-00356485, version 1

Collections

UNIV-ST-ETIENNE | UDL

Citation

Christian Gautier, G. Moulard, Jean-Pierre Chatelon, G. Motyl. Influence of substrate bias voltage on the in situ stress measured by an improved optical cantilever technique of sputtered chromium films. Thin Solid Films, Elsevier, 2001, 384, pp.102-108. ⟨ujm-00356485⟩

Export

BibTeX TEI DC DCterms EndNote

Share

Metrics

Record views

114