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Journal Articles Thin Solid Films Year : 2001

Influence of substrate bias voltage on the in situ stress measured by an improved optical cantilever technique of sputtered chromium films

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Christian Gautier
  • Function : Author
G. Moulard
  • Function : Author
G. Motyl
  • Function : Author
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Dates and versions

ujm-00356485 , version 1 (27-01-2009)

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  • HAL Id : ujm-00356485 , version 1

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Christian Gautier, G. Moulard, Jean-Pierre Chatelon, G. Motyl. Influence of substrate bias voltage on the in situ stress measured by an improved optical cantilever technique of sputtered chromium films. Thin Solid Films, 2001, 384, pp.102-108. ⟨ujm-00356485⟩
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