Influence of substrate bias voltage on the in situ stress measured by an improved optical cantilever technique of sputtered chromium films

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https://hal-ujm.archives-ouvertes.fr/ujm-00356485
Contributor : Jean-Pierre Chatelon <>
Submitted on : Tuesday, January 27, 2009 - 3:45:56 PM
Last modification on : Wednesday, November 6, 2019 - 6:26:11 PM

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  • HAL Id : ujm-00356485, version 1

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Christian Gautier, G. Moulard, Jean-Pierre Chatelon, G. Motyl. Influence of substrate bias voltage on the in situ stress measured by an improved optical cantilever technique of sputtered chromium films. Thin Solid Films, Elsevier, 2001, 384, pp.102-108. ⟨ujm-00356485⟩

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