Phasemask Grating Printing Extended To The Resonance Domain By High Index Corrugation

Y. Jourlin 1 Y. Bourgin 1 S. Tonchev 1 C. Veillas 1 E. Gamet 1 O. Parriaux 1 A. Talneau 2 P. Karvinen 3 N. Passilly 3 A. Md Zain 4 R.M. de la Rue 4
1 LHC - Laboratoire Hubert Curien [Saint Etienne]
2 LPN - Laboratoire de photonique et de nanostructures
3 JOE - University of Joensuu, Department of Physics and Mathematics
4 Dpt of Electronics & Electrical Engineering
Abstract : Zeroth transmitted order suppression in a phasemask of wavelength scale period is achieved by making the binary corrugation in a high index layer deposited on a transparent substrate. The produced single spatial frequency interferogram can also be created in the presence of an immersion liquid.
Keywords : gratings Phase mask
Document type :
Conference papers
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https://hal-ujm.archives-ouvertes.fr/ujm-00357013
Contributor : Yves Jourlin <>
Submitted on : Thursday, January 29, 2009 - 11:47:37 AM
Last modification on : Tuesday, November 19, 2019 - 11:55:26 AM

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  • HAL Id : ujm-00357013, version 1

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UNIV-ST-ETIENNE | CNRS | LAHC | PARISTECH | IOGS

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Y. Jourlin, Y. Bourgin, S. Tonchev, C. Veillas, E. Gamet, et al.. Phasemask Grating Printing Extended To The Resonance Domain By High Index Corrugation. 14th MICROOPTICS CONFERENCE (MOC '08), Sep 2008, BRUSSELS, Belgium. pp.40-41. ⟨ujm-00357013⟩

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