NEMO EPIXNET grating phasemask for 50nm characteristic dimension

Yves Jourlin 1 Yannick Bourgin 1 Svetlen Tonchev 1, 2, 3 Colette Veillas 1, 4 Emilie Gamet 1 Olivier Parriaux 1 Anne Talneau 5 P. Karvinen 6 Nicolas Passilly 7 A. Md Zain 8 R.M. de la Rue 8
1 LHC - Laboratoire Hubert Curien [Saint Etienne]
2 ISSP - ISSP
3 ISSP - Institut of the Solid State Physics
4 TSI - Laboratoire du traitement du signal et instrumentation
5 LPN - Laboratoire de photonique et de nanostructures
6 JOE - University of Joensuu, Department of Physics and Mathematics
7 Department of Physics and Mathematics
8 Dpt of Electronics & Electrical Engineering
Keywords : diffraction grating high index phase mask interference lithography
Document type :
Conference papers
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https://hal-ujm.archives-ouvertes.fr/ujm-00372488
Contributor : Yannick Bourgin <>
Submitted on : Wednesday, April 1, 2009 - 12:07:51 PM
Last modification on : Friday, September 6, 2019 - 11:14:03 AM

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  • HAL Id : ujm-00372488, version 1

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UNIV-ST-ETIENNE | CNRS | LAHC | PARISTECH | IOGS

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Yves Jourlin, Yannick Bourgin, Svetlen Tonchev, Colette Veillas, Emilie Gamet, et al.. NEMO EPIXNET grating phasemask for 50nm characteristic dimension. General Scientific Networking Meeting of NEMO, Apr 2009, Santiago de compostela, Spain. ⟨ujm-00372488⟩

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