NEMO EPIXNET grating phasemask for 50nm characteristic dimension

Yves Jourlin (1) , Yannick Bourgin (1) , Svetlen Tonchev (1, 2, 3) , Colette Veillas (1, 1) , Emilie Gamet (1) , Olivier Parriaux (1) , Anne Talneau (4) , P. Karvinen (5) , Nicolas Passilly (6) , A. Md Zain (7) , R.M. de La Rue (7)

1 LHC - Laboratoire Hubert Curien
2 ISSP - ISSP
3 ISSP - Institut of the Solid State Physics
4 LPN - Laboratoire de photonique et de nanostructures
5 JOE - University of Joensuu, Department of Physics and Mathematics
6 Department of Physics and Mathematics
7 Dpt of Electronics & Electrical Engineering

Keywords: diffraction grating; high index phase mask; interference lithography

Domains: Engineering Sciences [physics]; Optics / Photonic

Yves Jourlin, Yannick Bourgin, Svetlen Tonchev, Colette Veillas, Emilie Gamet, et al.. NEMO EPIXNET grating phasemask for 50nm characteristic dimension. General Scientific Networking Meeting of NEMO, Apr 2009, Santiago de compostela, Spain. ⟨ujm-00372488⟩