Measurement of femtosecond laser-induced damage and ablation thresholds in dielectrics

Nicolas Sanner Olivier Utéza 1 Benoît Bussiere 1 G. Coustillier 1 A. Leray 1 Tatiana Itina Marc Sentis 1
1 LP3 - Laboratoire Lasers, Plasmas et Procédés photoniques
Abstract : The paper is focused on the importance of accurate determination of surface damage/ablation threshold of a dielectric material irradiated with femtosecond laser pulses. We show that different damage characterization techniques and data treatment procedures from a single experiment provide complementary physical results characterizing laser–matter interaction. We thus compare and discuss two regression techniques, well adapted to the measurement of laser ablation threshold, and a statistical approach giving the laser damage threshold and further information concerning the deterministic character of femtosecond damage. These two measurements are crucial for laser micromachining processes and high peak-power laser technology in general.
Keywords : Laser dammage threshold dielectric
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Journal articles
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https://hal-ujm.archives-ouvertes.fr/ujm-00376891
Contributor : Tatiana Itina <>
Submitted on : Monday, April 20, 2009 - 2:48:40 PM
Last modification on : Thursday, January 18, 2018 - 2:01:54 AM

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Nicolas Sanner, Olivier Utéza, Benoît Bussiere, G. Coustillier, A. Leray, et al.. Measurement of femtosecond laser-induced damage and ablation thresholds in dielectrics. Applied physics. A, Materials science & processing, Springer Verlag, 2009, 94 (4), pp.889. ⟨10.1007/s00339-009-5077-6⟩. ⟨ujm-00376891⟩

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