Monte Carlo simulation of pulsed laser ablation from two-component target into diluted ambient gas

Abstract : Laser ablation from a binary target into a diluted gas background is studied by means of a Monte Carlo simulation. The influence of the ambient gas on the spatial and mean energy distribution of particles deposited at the distant detector is considered. Thermalization of the particles, the random scattering effect and the backscattering of particles were observed. Considerable modification of the deposited film thickness profiles due to collisions of the ablated particles with the ambient gas is shown. The increase of the ambient gas pressure was found to affect the stoichiometry distribution of deposited and backscattered particles. The study is of a particular interest for the development of the thin film growing technique known as pulsed laser deposition.
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Article dans une revue
Journal of Applied Physics, American Institute of Physics, 1997, 82, pp.3536. 〈10.1063/1.365672〉
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https://hal-ujm.archives-ouvertes.fr/ujm-00378598
Contributeur : Tatiana Itina <>
Soumis le : vendredi 24 avril 2009 - 17:53:26
Dernière modification le : jeudi 18 janvier 2018 - 01:41:06

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Tatiana Itina, W. Marine, M. Autric. Monte Carlo simulation of pulsed laser ablation from two-component target into diluted ambient gas. Journal of Applied Physics, American Institute of Physics, 1997, 82, pp.3536. 〈10.1063/1.365672〉. 〈ujm-00378598〉

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