Photolithography of variable depth gratings on a polymer substrate for the mastering of 3D diffractive optical elements - Archive ouverte HAL Access content directly
Conference Papers Year : 2008

Photolithography of variable depth gratings on a polymer substrate for the mastering of 3D diffractive optical elements

Abstract

A set of photoresist processes permits the printing of a variable depth sinusoidal profile grating in a positive photoresist layer deposited on a PMMA substrate without degradation of the substrate surface for further moulding tool fabrication with damageless dissolution of the polymer master.
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Dates and versions

ujm-00381710 , version 1 (06-05-2009)

Identifiers

  • HAL Id : ujm-00381710 , version 1

Cite

S. Tonchev, Y. Jourlin, S. Reynaud, M. Guttmann, M. Wissmann, et al.. Photolithography of variable depth gratings on a polymer substrate for the mastering of 3D diffractive optical elements. 14th MICROOPTICS CONFERENCE (MOC '08), Sep 2008, Belgium. pp160-161. ⟨ujm-00381710⟩
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