Photolithography of variable depth gratings on a polymer substrate for the mastering of 3D diffractive optical elements

S. Tonchev 1 Y. Jourlin 1 S. Reynaud 1 M. Guttmann 2 M. Wissmann 2 R. Krajewski 3 M. Joswik 3
1 LHC - Laboratoire Hubert Curien [Saint Etienne]
2 FZK - Forschungszentrum Karlsruhe
3 Warsaw University of Technology [Warsaw]
Abstract : A set of photoresist processes permits the printing of a variable depth sinusoidal profile grating in a positive photoresist layer deposited on a PMMA substrate without degradation of the substrate surface for further moulding tool fabrication with damageless dissolution of the polymer master.
Keywords : Diffractive optical elements photolithography
Document type :
Conference papers
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https://hal-ujm.archives-ouvertes.fr/ujm-00381710
Contributor : Yves Jourlin <>
Submitted on : Wednesday, May 6, 2009 - 2:18:08 PM
Last modification on : Thursday, November 21, 2019 - 2:15:35 AM

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  • HAL Id : ujm-00381710, version 1

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UNIV-ST-ETIENNE | CNRS | LAHC | IOGS | PARISTECH | UDL

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S. Tonchev, Y. Jourlin, S. Reynaud, M. Guttmann, M. Wissmann, et al.. Photolithography of variable depth gratings on a polymer substrate for the mastering of 3D diffractive optical elements. 14th MICROOPTICS CONFERENCE (MOC '08), Sep 2008, Belgium. pp160-161. ⟨ujm-00381710⟩

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