Photolithography of variable depth gratings on a polymer substrate for the mastering of 3D diffractive optical elements

S. Tonchev 1 Y. Jourlin 1 S. Reynaud 1 M. Guttmann 2 M. Wissmann 2 R. Krajewski 3 M. Joswik 3
1 LHC - Laboratoire Hubert Curien [Saint Etienne]
2 FZK - Forschungszentrum Karlsruhe
3 Warsaw University of Technology [Warsaw]
Abstract : A set of photoresist processes permits the printing of a variable depth sinusoidal profile grating in a positive photoresist layer deposited on a PMMA substrate without degradation of the substrate surface for further moulding tool fabrication with damageless dissolution of the polymer master.
Keywords : Diffractive optical elements photolithography
Type de document :
Communication dans un congrès
14th MICROOPTICS CONFERENCE (MOC '08), Sep 2008, Belgium. pp160-161, 2008
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https://hal-ujm.archives-ouvertes.fr/ujm-00381710
Contributeur : Yves Jourlin <>
Soumis le : mercredi 6 mai 2009 - 14:18:08
Dernière modification le : mercredi 25 juillet 2018 - 14:05:31

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  • HAL Id : ujm-00381710, version 1

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UNIV-ST-ETIENNE | LAHC | IOGS | PARISTECH

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S. Tonchev, Y. Jourlin, S. Reynaud, M. Guttmann, M. Wissmann, et al.. Photolithography of variable depth gratings on a polymer substrate for the mastering of 3D diffractive optical elements. 14th MICROOPTICS CONFERENCE (MOC '08), Sep 2008, Belgium. pp160-161, 2008. 〈ujm-00381710〉

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