Ultrafast laser photoinscription of polarization sensitive devices in bulk silica glass

Abstract : Ultrashort pulsed laser irradiation of bulk fused silica may result under specific energetic conditions in the self-organization of subwavelength material redistribution regions within the laser trace. The modulated structures have birefringent properties and show unusual anisotropic light scattering and reflection characteristics. We report here on the formation of waveguiding structures with remarkable polarization effects for infrared light. The photoinscription process using 800 nm femtosecond laser pulses is accompanied by third harmonic generation and polarization dependent anisotropic scattering of UV photons. The photowritten structures can be arranged in three-dimensional patterns generating complex propagation and polarization effects due to the anisotropic optical properties.
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Journal articles
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https://hal-ujm.archives-ouvertes.fr/ujm-00387072
Contributor : Razvan Stoian <>
Submitted on : Saturday, May 23, 2009 - 10:39:58 AM
Last modification on : Wednesday, July 25, 2018 - 2:05:31 PM

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  • HAL Id : ujm-00387072, version 1

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Guanghua Cheng, Konstantin Mishchik, Cyril Mauclair, Eric Audouard, Razvan Stoian. Ultrafast laser photoinscription of polarization sensitive devices in bulk silica glass. Optics Express, Optical Society of America, 2009, 17, pp.9515. ⟨ujm-00387072⟩

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