Monolithic double-grating phase mask for high-spatial-coherence large-period grating printing

Yannick Bourgin; Sanaa Bakkali; Yves Jourlin; Svetlen Tonchev; Olivier Parriaux

Journal articles

Monolithic double-grating phase mask for high-spatial-coherence large-period grating printing

Yannick Bourgin ¹ Sanaa Bakkali ¹ Yves Jourlin ^{1, *} Svetlen Tonchev ^{1, 2} Olivier Parriaux ¹

* Corresponding author

1 LHC - Laboratoire Hubert Curien [Saint Etienne]

2 ISSP - Institut of the Solid State Physics

Abstract : A monolithic double-grating phase mask comprising three short-pitch grating sections of spatial frequencies k1 and k2 collocated at one side of a substrate produces a large-period interferogram without higher harmonics to print in a photoresist film a latent grating of small spatial frequency equal to twice k2−k1. When incorporated in a write-on-the-fly scheme, the elements permit the fabrication of unlimitedly long gratings.

Keywords : Diffraction gratings Optical fabrication Subwavelength structures

Document type :

Journal articles

Domain :

Engineering Sciences [physics] / Optics / Photonic

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https://hal-ujm.archives-ouvertes.fr/ujm-00437446
Contributor : Yannick Bourgin Connect in order to contact the contributor
Submitted on : Monday, November 30, 2009 - 3:55:08 PM
Last modification on : Tuesday, October 6, 2020 - 4:26:40 PM

Monolithic double-grating phase mask for high-spatial-coherence large-period grating printing

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Monolithic double-grating phase mask for high-spatial-coherence large-period grating printing

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