Monolithic double-grating phase mask for high-spatial-coherence large-period grating printing

Yannick Bourgin (1) , Sanaa Bakkali (1) , Yves Jourlin (1) , Svetlen Tonchev (1, 2) , Olivier Parriaux (1)

1 LHC - Laboratoire Hubert Curien
2 ISSP - Institut of the Solid State Physics

A monolithic double-grating phase mask comprising three short-pitch grating sections of spatial frequencies k1 and k2 collocated at one side of a substrate produces a large-period interferogram without higher harmonics to print in a photoresist film a latent grating of small spatial frequency equal to twice k2−k1. When incorporated in a write-on-the-fly scheme, the elements permit the fabrication of unlimitedly long gratings.

Keywords: Diffraction gratings; Optical fabrication; Subwavelength structures

Domains: Optics / Photonic

Yannick Bourgin, Sanaa Bakkali, Yves Jourlin, Svetlen Tonchev, Olivier Parriaux. Monolithic double-grating phase mask for high-spatial-coherence large-period grating printing. Optics Letters, 2009, 34 (24), pp.116595. ⟨ujm-00437446⟩