Monolithic double-grating phase mask for high-spatial-coherence large-period grating printing - Université Jean-Monnet-Saint-Étienne Access content directly
Journal Articles Optics Letters Year : 2009

Monolithic double-grating phase mask for high-spatial-coherence large-period grating printing

Abstract

A monolithic double-grating phase mask comprising three short-pitch grating sections of spatial frequencies k1 and k2 collocated at one side of a substrate produces a large-period interferogram without higher harmonics to print in a photoresist film a latent grating of small spatial frequency equal to twice k2−k1. When incorporated in a write-on-the-fly scheme, the elements permit the fabrication of unlimitedly long gratings.
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Dates and versions

ujm-00437446 , version 1 (30-11-2009)

Identifiers

  • HAL Id : ujm-00437446 , version 1

Cite

Yannick Bourgin, Sanaa Bakkali, Yves Jourlin, Svetlen Tonchev, Olivier Parriaux. Monolithic double-grating phase mask for high-spatial-coherence large-period grating printing. Optics Letters, 2009, 34 (24), pp.116595. ⟨ujm-00437446⟩
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