Monolithic double-grating phase mask for high-spatial-coherence large-period grating printing

Yannick Bourgin 1 Sanaa Bakkali 1 Yves Jourlin 1, * Svetlen Tonchev 1, 2 Olivier Parriaux 1
* Auteur correspondant
1 LHC - Laboratoire Hubert Curien [Saint Etienne]
2 ISSP - Institute of Solid State Physics
Abstract : A monolithic double-grating phase mask comprising three short-pitch grating sections of spatial frequencies k1 and k2 collocated at one side of a substrate produces a large-period interferogram without higher harmonics to print in a photoresist film a latent grating of small spatial frequency equal to twice k2−k1. When incorporated in a write-on-the-fly scheme, the elements permit the fabrication of unlimitedly long gratings.
Keywords : Diffraction gratings Optical fabrication Subwavelength structures
Type de document :
Article dans une revue
Optics Letters, Optical Society of America, 2009, 34 (24), pp.116595
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https://hal-ujm.archives-ouvertes.fr/ujm-00437446
Contributeur : Yannick Bourgin <>
Soumis le : lundi 30 novembre 2009 - 15:55:08
Dernière modification le : mercredi 25 juillet 2018 - 14:05:30

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  • HAL Id : ujm-00437446, version 1

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UNIV-ST-ETIENNE | LAHC | IOGS | PARISTECH

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Yannick Bourgin, Sanaa Bakkali, Yves Jourlin, Svetlen Tonchev, Olivier Parriaux. Monolithic double-grating phase mask for high-spatial-coherence large-period grating printing. Optics Letters, Optical Society of America, 2009, 34 (24), pp.116595. 〈ujm-00437446〉

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