Monolithic double-grating phase mask for high-spatial-coherence large-period grating printing

Yannick Bourgin 1 Sanaa Bakkali 1 Yves Jourlin 1, * Svetlen Tonchev 1, 2 Olivier Parriaux 1
* Corresponding author
1 LHC - Laboratoire Hubert Curien [Saint Etienne]
2 ISSP - Institut of the Solid State Physics
Abstract : A monolithic double-grating phase mask comprising three short-pitch grating sections of spatial frequencies k1 and k2 collocated at one side of a substrate produces a large-period interferogram without higher harmonics to print in a photoresist film a latent grating of small spatial frequency equal to twice k2−k1. When incorporated in a write-on-the-fly scheme, the elements permit the fabrication of unlimitedly long gratings.
Keywords : Diffraction gratings Optical fabrication Subwavelength structures
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Journal articles
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https://hal-ujm.archives-ouvertes.fr/ujm-00437446
Contributor : Yannick Bourgin <>
Submitted on : Monday, November 30, 2009 - 3:55:08 PM
Last modification on : Friday, September 6, 2019 - 11:14:03 AM

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  • HAL Id : ujm-00437446, version 1

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UNIV-ST-ETIENNE | CNRS | LAHC | IOGS | PARISTECH

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Yannick Bourgin, Sanaa Bakkali, Yves Jourlin, Svetlen Tonchev, Olivier Parriaux. Monolithic double-grating phase mask for high-spatial-coherence large-period grating printing. Optics Letters, Optical Society of America, 2009, 34 (24), pp.116595. ⟨ujm-00437446⟩

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