100 nm period grating writing by high index phase mask immersion lithography

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https://hal-ujm.archives-ouvertes.fr/ujm-00477277
Contributor : Yannick Bourgin <>
Submitted on : Wednesday, April 28, 2010 - 3:36:04 PM
Last modification on : Friday, September 6, 2019 - 11:14:03 AM

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Yannick Bourgin, Yves Jourlin, Olivier Parriaux, Svetlen Tonchev, Anne Talneau, et al.. 100 nm period grating writing by high index phase mask immersion lithography. 35th Micro Nano Engineering (MNE), Sep 2009, Gand, Belgium. pp.P-LITH-51. ⟨ujm-00477277⟩

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