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Conference Papers Year : 2009

100 nm period grating writing by high index phase mask immersion lithography

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Dates and versions

ujm-00477277 , version 1 (28-04-2010)

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  • HAL Id : ujm-00477277 , version 1

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Yannick Bourgin, Yves Jourlin, Olivier Parriaux, Svetlen Tonchev, Anne Talneau, et al.. 100 nm period grating writing by high index phase mask immersion lithography. 35th Micro Nano Engineering (MNE), Sep 2009, Gand, Belgium. pp.P-LITH-51. ⟨ujm-00477277⟩
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