100 nm period grating writing by high index phase mask immersion lithography - Université Jean-Monnet-Saint-Étienne Access content directly
Conference Papers Year : 2009
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ujm-00477277 , version 1 (28-04-2010)

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  • HAL Id : ujm-00477277 , version 1

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Yannick Bourgin, Yves Jourlin, Olivier Parriaux, Svetlen Tonchev, Anne Talneau, et al.. 100 nm period grating writing by high index phase mask immersion lithography. 35th Micro Nano Engineering (MNE), Sep 2009, Gand, Belgium. pp.P-LITH-51. ⟨ujm-00477277⟩
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