100 nm period grating writing by high index phase mask immersion lithography

Yannick Bourgin (1) , Yves Jourlin (1) , Olivier Parriaux (1) , Svetlen Tonchev (1, 2) , Anne Talneau (3) , Colette Veillas (1)

1 LHC - Laboratoire Hubert Curien [Saint Etienne]
2 ISSP - Institut of the Solid State Physics
3 LPN - Laboratoire de photonique et de nanostructures

Keywords: nanostructure fabrication; diffraction grating; immersion lithography

Domains: Engineering Sciences [physics]; Optics / Photonic

Yannick Bourgin, Yves Jourlin, Olivier Parriaux, Svetlen Tonchev, Anne Talneau, et al.. 100 nm period grating writing by high index phase mask immersion lithography. 35th Micro Nano Engineering (MNE), Sep 2009, Gand, Belgium. pp.P-LITH-51. ⟨ujm-00477277⟩