100 nm period grating writing by high index phase mask immersion lithography

Yannick Bourgin 1 Yves Jourlin 1 Olivier Parriaux 1 Svetlen Tonchev 1, 2 Anne Talneau 3 Colette Veillas 1
1 LHC - Laboratoire Hubert Curien [Saint Etienne]
2 ISSP - Institut of the Solid State Physics
3 LPN - Laboratoire de photonique et de nanostructures
Keywords : nanostructure fabrication diffraction grating immersion lithography
Document type :
Conference papers
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https://hal-ujm.archives-ouvertes.fr/ujm-00477277
Contributor : Yannick Bourgin <>
Submitted on : Wednesday, April 28, 2010 - 3:36:04 PM
Last modification on : Friday, September 6, 2019 - 11:14:03 AM

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  • HAL Id : ujm-00477277, version 1

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UNIV-ST-ETIENNE | LAHC | IOGS | PARISTECH

Citation

Yannick Bourgin, Yves Jourlin, Olivier Parriaux, Svetlen Tonchev, Anne Talneau, et al.. 100 nm period grating writing by high index phase mask immersion lithography. 35th Micro Nano Engineering (MNE), Sep 2009, Gand, Belgium. pp.P-LITH-51. ⟨ujm-00477277⟩

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