100 nm period grating by high-index phase-mask immersion lithography

Yannick Bourgin; Yves Jourlin; Olivier Parriaux; Anne Talneau; Svetlen Tonchev; Colette Veillas; P. Karvinen; Nicolas Passilly; Ahmad Md Zain; R.M. de la Rue; Jurgen van Erps; David Troadec

100 nm period grating by high-index phase-mask immersion lithography

Yannick Bourgin ¹ Yves Jourlin ¹ Olivier Parriaux ¹ Anne Talneau ² Svetlen Tonchev ^{1, 3} Colette Veillas ¹ P. Karvinen ⁴ Nicolas Passilly ⁵ Ahmad Md Zain ⁶ R.M. de la Rue ⁷ Jurgen van Erps ⁸ David Troadec ⁹

1 LHC - Laboratoire Hubert Curien [Saint Etienne]

2 LPN - Laboratoire de photonique et de nanostructures

3 ISSP - Institut of the Solid State Physics

4 JOE - University of Joensuu, Department of Physics and Mathematics

5 FEMTO-ST - Franche-Comté Électronique Mécanique, Thermique et Optique - Sciences et Technologies (UMR 6174)

6 Photonics Research Group, Centre for Communication,

7 Dpt of Electronics & Electrical Engineering

8 TONA - Department of Applied Physics and Photonics [Brussels]

9 IEMN - Institut d’Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520

Keywords : Nanostructure fabrication Diffraction gratings Subwavelength structures Lithography Nanostructure fabrication.

Document type :

Journal articles

Domain :

Engineering Sciences [physics] / Optics / Photonic

Complete list of metadatas

https://hal-ujm.archives-ouvertes.fr/ujm-00481902
Contributor : Yannick Bourgin <>
Submitted on : Friday, May 7, 2010 - 3:20:52 PM
Last modification on : Friday, September 6, 2019 - 11:14:03 AM

100 nm period grating by high-index phase-mask immersion lithography

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100 nm period grating by high-index phase-mask immersion lithography

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