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100 nm period grating by high-index phase-mask immersion lithography

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https://hal-ujm.archives-ouvertes.fr/ujm-00481902
Contributor : Yannick Bourgin <>
Submitted on : Friday, May 7, 2010 - 3:20:52 PM
Last modification on : Thursday, June 4, 2020 - 11:46:02 AM

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  • HAL Id : ujm-00481902, version 1

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Yannick Bourgin, Yves Jourlin, Olivier Parriaux, Anne Talneau, Svetlen Tonchev, et al.. 100 nm period grating by high-index phase-mask immersion lithography. Optics Express, Optical Society of America, 2010, 18 (10), pp.10557-10566. ⟨ujm-00481902⟩

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