On-the-fly writing of a long grating phase mask

Abstract : A method is demonstrated for writing long grating phase masks, which can be used for patterning large-area (square meter size) submicron-period gratings. The method consist of illuminating a small area transmission grating phase mask by a continous wave transverse-electric-polarized collimated laser beam under the −1st order Littrow mounting to define a high-contrast interferogram composed of fringes. By sliding a long photoresist-coated substrate under this small area phase mask, gratings of arbitrary length may be written, with grating lines oriented in the scan direction. The patterning of uninterrupted gratings with lengths exceeding 300 mm is demonstrated.
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Article dans une revue
Optical Engineering, SPIE, 2011, 50 (3), pp.038001. 〈10.1117/1.3549254〉
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https://hal-ujm.archives-ouvertes.fr/ujm-00578025
Contributeur : Yannick Bourgin <>
Soumis le : vendredi 18 mars 2011 - 10:28:11
Dernière modification le : mercredi 25 juillet 2018 - 14:05:31

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Philipp Müller, Yves Jourlin, Colette Veillas, Gérard Bernaud, Yannick Bourgin, et al.. On-the-fly writing of a long grating phase mask. Optical Engineering, SPIE, 2011, 50 (3), pp.038001. 〈10.1117/1.3549254〉. 〈ujm-00578025〉

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