Three grating monolithic phase-mask for the single-order writing of large-period gratings

Abstract : A new type of achromatic high-efficiency monolithic phase mask is presented. The mask comprises three submicron period diffraction gratings at a single substrate side that create a purely single spatial frequency interferogram of large period. The optical scheme is that of an integrated Mach-Zehnder interferometer where all light circulation functions are performed by diffraction gratings. The paper describes the operation principle of the phase mask, the fabrication process, and its utilization in a write-on-the-fly scheme for the writing of a long, 2 µm-period grating.
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jeos:rp, 2011, 6, pp.11016s. 〈10.2971/jeos.2011.11016s〉
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https://hal-ujm.archives-ouvertes.fr/ujm-00587159
Contributeur : Yannick Bourgin <>
Soumis le : mardi 19 avril 2011 - 15:55:44
Dernière modification le : jeudi 11 janvier 2018 - 06:20:35

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Yannick Bourgin, Ismo Vartiainen, Yves Jourlin, Markku Kuittinen, Frederic Celle, et al.. Three grating monolithic phase-mask for the single-order writing of large-period gratings. jeos:rp, 2011, 6, pp.11016s. 〈10.2971/jeos.2011.11016s〉. 〈ujm-00587159〉

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