Three grating monolithic phase-mask for the single-order writing of large-period gratings

Yannick Bourgin (1) , Ismo Vartiainen (2) , Yves Jourlin (1) , Markku Kuittinen (2) , Frederic Celle (1) , Svetlen Tonchev (1, 3) , Olivier Parriaux (1) , Tapio Niemi (4)

1 LHC - Laboratoire Hubert Curien
2 department of physics and mathematics- campus of Joensuu
3 ISSP - Institut of the Solid State Physics
4 TUT - Tampere University of Technology [Tampere]

A new type of achromatic high-efficiency monolithic phase mask is presented. The mask comprises three submicron period diffraction gratings at a single substrate side that create a purely single spatial frequency interferogram of large period. The optical scheme is that of an integrated Mach-Zehnder interferometer where all light circulation functions are performed by diffraction gratings. The paper describes the operation principle of the phase mask, the fabrication process, and its utilization in a write-on-the-fly scheme for the writing of a long, 2 µm-period grating.

Keywords: micro-optics; diffraction grating; optical lithography; nanostructure fabrication

Domains: Optics / Photonic

Yannick Bourgin, Ismo Vartiainen, Yves Jourlin, Markku Kuittinen, Frederic Celle, et al.. Three grating monolithic phase-mask for the single-order writing of large-period gratings. jeos:rp, 2011, 6, pp.11016s. ⟨10.2971/jeos.2011.11016s⟩. ⟨ujm-00587159⟩