Skip to Main content Skip to Navigation
New interface
Conference papers

Wide phase-mask printing of large area gratings with proportionate investment costs

Yannick Bourgin 1 Yves Jourlin 1 Philipp Müller 1, 2 Bernard Kress 3 Thomas Kampfe 1, 4 Ismo Vartiainen 5 Markku Kuittinen 5 Olivier Parriaux 1 Ernst-Bernhard Kley 4 
1 LHC - Laboratoire Hubert Curien [Saint Etienne]
2 IMTEK - Department of Microsystems Engineering [Freiburg]
3 LSP - Laboratoire des Systèmes Photoniques
4 IAP - Institute of Applied Physics
5 department of physics and mathematics- campus of Joensuu
Abstract : A large-grating printing strategy resorting to an unusually wide phase-mask carrying the essential characteristics of the grating spatial coherence defines a new manufacturing method where the needed investments only scale up slowly with the grating size, thus permitting the origination of grating areas beyond a one square meter area.
Document type :
Conference papers
Complete list of metadata
https://hal-ujm.archives-ouvertes.fr/ujm-00602521
Contributor : Yannick Bourgin Connect in order to contact the contributor
Submitted on : Wednesday, June 22, 2011 - 5:21:45 PM
Last modification on : Saturday, June 25, 2022 - 10:52:24 AM

Identifiers

  • HAL Id : ujm-00602521, version 1

Collections

UNIV-ST-ETIENNE | CNRS | LAHC | UDL

Citation

Yannick Bourgin, Yves Jourlin, Philipp Müller, Bernard Kress, Thomas Kampfe, et al.. Wide phase-mask printing of large area gratings with proportionate investment costs. 2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011), May 2011, Munich, Germany. pp.4388. ⟨ujm-00602521⟩

Export

BibTeX TEI DC DCterms EndNote Datacite

Share

Metrics

Record views

74