Expanding the applicability domain of phase-mask lithography of gratings to the extreme

Abstract : The applicability domain of phase-masks for the manufacturing of gratings is widely expanded by breaking the limits of a so far very narrow spatial frequency spectral width. This is a result of searching for high index deep-UV film materials and of resorting to a novel phase-mask scheme at the large period side.
Type de document :
Communication dans un congrès
2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011), May 2011, Munich, Germany. pp.4391, 2011
Liste complète des métadonnées

https://hal-ujm.archives-ouvertes.fr/ujm-00602526
Contributeur : Yannick Bourgin <>
Soumis le : mercredi 22 juin 2011 - 17:30:48
Dernière modification le : mercredi 25 juillet 2018 - 14:05:30

Identifiants

  • HAL Id : ujm-00602526, version 1

Collections

Citation

Yannick Bourgin, Yves Jourlin, Svetlen Tonchev, Ismo Vartiainen, Olivier Parriaux, et al.. Expanding the applicability domain of phase-mask lithography of gratings to the extreme. 2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011), May 2011, Munich, Germany. pp.4391, 2011. 〈ujm-00602526〉

Partager

Métriques

Consultations de la notice

74