Yannick Bourgin, Yves Jourlin, Svetlen Tonchev, Ismo Vartiainen, Olivier Parriaux, et al.. Expanding the applicability domain of phase-mask lithography of gratings to the extreme.
2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011), May 2011, Munich, Germany. pp.4391.
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