Expanding the applicability domain of phase-mask lithography of gratings to the extreme

Yannick Bourgin (1) , Yves Jourlin (1) , Svetlen Tonchev (1, 2) , Ismo Vartiainen (3) , Olivier Parriaux (1) , Markku Kuittinen (3) , Anne Talneau (4)

1 LHC - Laboratoire Hubert Curien
2 ISSP - Institut of the Solid State Physics
3 department of physics and mathematics- campus of Joensuu
4 LPN - Laboratoire de photonique et de nanostructures

The applicability domain of phase-masks for the manufacturing of gratings is widely expanded by breaking the limits of a so far very narrow spatial frequency spectral width. This is a result of searching for high index deep-UV film materials and of resorting to a novel phase-mask scheme at the large period side.

Domaines: Optique / photonique

Yannick Bourgin, Yves Jourlin, Svetlen Tonchev, Ismo Vartiainen, Olivier Parriaux, et al.. Expanding the applicability domain of phase-mask lithography of gratings to the extreme. 2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011), May 2011, Munich, Germany. pp.4391. ⟨ujm-00602526⟩