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Université Jean Monnet – Saint-Etienne |  |
Conference papers
Expanding the applicability domain of phase-mask lithography of gratings to the extreme
Yannick Bourgin
1
Yves Jourlin
1
Svetlen Tonchev
1, 2
Ismo Vartiainen
3
Olivier Parriaux
1
Markku Kuittinen
3
Anne Talneau
4
Yannick Bourgin 1
Mail :
Author
Yves Jourlin 1
Mail :
Author
Svetlen Tonchev 1, 2
Author
Ismo Vartiainen 3
Author
1
LHC - Laboratoire Hubert Curien [Saint Etienne] (18 rue du Professeur Lauras 42000 SAINT-ETIENNE - France)
- IOGS - Institut d'Optique Graduate School (2 avenue Augustin Fresnel, 91127 Palaiseau Cedex - France)
- UJM - Université Jean Monnet [Saint-Étienne] (10 rue Tréfilerie - 42100 Saint-Étienne - France)
- CNRS - Centre National de la Recherche Scientifique : UMR5516 (France)
2
ISSP - Institut of the Solid State Physics (72 Tzarigradsko Chaussee Blud 1784 Sofia - Bulgaria)
- BAS - Bulgarian Academy of Sciences (15th November #1 str, Sofia, 1040 - Bulgaria)
3
department of physics and mathematics- campus of Joensuu (Itä-Suomen yliopisto Fysiikan ja matematiikan laitos Joensuun kampus Yliopistokatu 7, Metria PL 111 Fi-80101 JOENSUU Finland - Finland)
- University of Eastern Finland ( Educa, Tulliportinkatu 1, 80130 Joensuu, Finland - Finland)
4
LPN - Laboratoire de photonique et de nanostructures (Route de Nozay 91460 MARCOUSSIS - France)
- CNRS - Centre National de la Recherche Scientifique : UPR20 (France)
Abstract : The applicability domain of phase-masks for the manufacturing of gratings is widely expanded by breaking the limits of a so far very narrow spatial frequency spectral width. This is a result of searching for high index deep-UV film materials and of resorting to a novel phase-mask scheme at the large period side.
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Conference papers
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Complete list of metadatas
https://hal-ujm.archives-ouvertes.fr/ujm-00602526
Contributor : Yannick Bourgin <>
Submitted on : Wednesday, June 22, 2011 - 5:30:48 PM
Last modification on : Monday, January 13, 2020 - 5:46:02 PM
Contributor : Yannick Bourgin <>
Submitted on : Wednesday, June 22, 2011 - 5:30:48 PM
Last modification on : Monday, January 13, 2020 - 5:46:02 PM
Identifiers
- HAL Id : ujm-00602526, version 1
Citation
Yannick Bourgin, Yves Jourlin, Svetlen Tonchev, Ismo Vartiainen, Olivier Parriaux, et al.. Expanding the applicability domain of phase-mask lithography of gratings to the extreme. 2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011), May 2011, Munich, Germany. pp.4391. ⟨ujm-00602526⟩
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