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Conference Papers Year : 2011

Expanding the applicability domain of phase-mask lithography of gratings to the extreme

Abstract

The applicability domain of phase-masks for the manufacturing of gratings is widely expanded by breaking the limits of a so far very narrow spatial frequency spectral width. This is a result of searching for high index deep-UV film materials and of resorting to a novel phase-mask scheme at the large period side.
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Dates and versions

ujm-00602526 , version 1 (22-06-2011)

Identifiers

  • HAL Id : ujm-00602526 , version 1

Cite

Yannick Bourgin, Yves Jourlin, Svetlen Tonchev, Ismo Vartiainen, Olivier Parriaux, et al.. Expanding the applicability domain of phase-mask lithography of gratings to the extreme. 2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011), May 2011, Munich, Germany. pp.4391. ⟨ujm-00602526⟩
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