Grating phase-mask lithography for subwavelength radial polarizer fabrication

Abstract : The grating manufacturing technology using a phase-mask is here expanded to the fabrication of circularly symmetrical gratings of radial periodicity with exposure by means of an incident beam of azimuthal polarization. The application example is a radial polarizer for the 442 nm line of an HeCd laser.
Document type :
Conference papers
Complete list of metadatas

https://hal-ujm.archives-ouvertes.fr/ujm-00612191
Contributor : Yves Jourlin <>
Submitted on : Thursday, July 28, 2011 - 11:50:41 AM
Last modification on : Friday, October 4, 2019 - 8:22:01 PM

Identifiers

  • HAL Id : ujm-00612191, version 1

Collections

Citation

Yves Jourlin, C. Veillas, S. Tonchev, Jean Sauvage-Vincent, U. Zeitner, et al.. Grating phase-mask lithography for subwavelength radial polarizer fabrication. 2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011), May 2011, Munich, France. paper 4394. ⟨ujm-00612191⟩

Share

Metrics

Record views

80