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Conference Papers Year : 2011

Grating phase-mask lithography for subwavelength radial polarizer fabrication

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Abstract

The grating manufacturing technology using a phase-mask is here expanded to the fabrication of circularly symmetrical gratings of radial periodicity with exposure by means of an incident beam of azimuthal polarization. The application example is a radial polarizer for the 442 nm line of an HeCd laser.
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Dates and versions

ujm-00612191 , version 1 (28-07-2011)

Identifiers

  • HAL Id : ujm-00612191 , version 1

Cite

Yves Jourlin, C. Veillas, S. Tonchev, Jean Sauvage-Vincent, U. Zeitner, et al.. Grating phase-mask lithography for subwavelength radial polarizer fabrication. 2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011), May 2011, Munich, France. paper 4394. ⟨ujm-00612191⟩
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