Grating phase-mask lithography for subwavelength radial polarizer fabrication

Abstract : The grating manufacturing technology using a phase-mask is here expanded to the fabrication of circularly symmetrical gratings of radial periodicity with exposure by means of an incident beam of azimuthal polarization. The application example is a radial polarizer for the 442 nm line of an HeCd laser.
Type de document :
Communication dans un congrès
2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011), May 2011, Munich, France. paper 4394, 2011
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https://hal-ujm.archives-ouvertes.fr/ujm-00612191
Contributeur : Yves Jourlin <>
Soumis le : jeudi 28 juillet 2011 - 11:50:41
Dernière modification le : mercredi 25 juillet 2018 - 14:05:30

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  • HAL Id : ujm-00612191, version 1

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Yves Jourlin, C. Veillas, S. Tonchev, Jean Sauvage-Vincent, U. Zeitner, et al.. Grating phase-mask lithography for subwavelength radial polarizer fabrication. 2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011), May 2011, Munich, France. paper 4394, 2011. 〈ujm-00612191〉

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