Grating phase-mask lithography for subwavelength radial polarizer fabrication

Yves Jourlin (1) , C. Veillas (1) , S. Tonchev (1) , Jean Sauvage-Vincent (1) , U. Zeitner (2) , O. Parriaux (1)

1 LHC - Laboratoire Hubert Curien
2 Fraunhofer IOF - Fraunhofer Institute for Applied Optics and Precision Engineering [Jena]

The grating manufacturing technology using a phase-mask is here expanded to the fabrication of circularly symmetrical gratings of radial periodicity with exposure by means of an incident beam of azimuthal polarization. The application example is a radial polarizer for the 442 nm line of an HeCd laser.

Domaines: Optique [physics.optics]

Yves Jourlin, C. Veillas, S. Tonchev, Jean Sauvage-Vincent, U. Zeitner, et al.. Grating phase-mask lithography for subwavelength radial polarizer fabrication. 2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011), May 2011, Munich, France. paper 4394. ⟨ujm-00612191⟩