New insights in photo-patterned sol-gel-derived TiO2 films

Abstract : Specific sol-gel formulations and protocols have been adapted to the fine patterning of TiO2 films using a very simplified UVA three-step lithography method. Mechanisms occurring during the photo-patterning procedure and a post-patterning thermal treatment have been studied by Fourier transform infrared spectroscopy, atomic force microscopy, X-ray diffraction, and ellipsometry. Discussions are proposed to support the influence of the photo-patterning procedure and post-patterning treatment on the shape and the dimension of so-formed microstructures. Original additional functionalities arising from such structures are also presented.
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J Mater Sci, 2011, 46 (5), pp.1474-1486. 〈10.1007/s10853-010-4949-7〉
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https://hal-ujm.archives-ouvertes.fr/ujm-00612244
Contributeur : Yves Jourlin <>
Soumis le : jeudi 28 juillet 2011 - 14:03:17
Dernière modification le : lundi 26 mars 2018 - 09:00:02

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S. Briche, Z. Tebby, D. Riassetto, M. Messaoud, E. Gamet, et al.. New insights in photo-patterned sol-gel-derived TiO2 films. J Mater Sci, 2011, 46 (5), pp.1474-1486. 〈10.1007/s10853-010-4949-7〉. 〈ujm-00612244〉

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