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New insights in photo-patterned sol-gel-derived TiO2 films

Abstract : Specific sol-gel formulations and protocols have been adapted to the fine patterning of TiO2 films using a very simplified UVA three-step lithography method. Mechanisms occurring during the photo-patterning procedure and a post-patterning thermal treatment have been studied by Fourier transform infrared spectroscopy, atomic force microscopy, X-ray diffraction, and ellipsometry. Discussions are proposed to support the influence of the photo-patterning procedure and post-patterning treatment on the shape and the dimension of so-formed microstructures. Original additional functionalities arising from such structures are also presented.
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Contributor : Yves Jourlin Connect in order to contact the contributor
Submitted on : Thursday, July 28, 2011 - 2:03:17 PM
Last modification on : Saturday, June 25, 2022 - 10:52:36 AM

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S. Briche, Z. Tebby, D. Riassetto, M. Messaoud, E. Gamet, et al.. New insights in photo-patterned sol-gel-derived TiO2 films. J Mater Sci, 2011, 46 (5), pp.1474-1486. ⟨10.1007/s10853-010-4949-7⟩. ⟨ujm-00612244⟩



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