Submicrometric gratings fabrication from photosensitive organo-silica-hafnia thin films elaborated by sol-gel processing

Janyce Franc (1, 2) , Vincent Barnier (3, 4) , Francis Vocanson (2) , Émilie Gamet (2) , Marilyne Lesage (2) , Damien Jamon (5) , Yves Jourlin (2)

1 LMA - Laboratoire des matériaux avancés
2 LHC - Laboratoire Hubert Curien
3 MPI-ENSMSE - Département Mécanique physique et interfaces
4 LCG-ENSMSE - UMR 5146 - Laboratoire Claude Goux
5 LT2C - Laboratoire Telecom Claude Chappe

The aim of this study is the elaboration of a high index sol-gel material in order to prepare submicrometric grating. The gratings were obtained after few seconds of UV exposure in one step using an organically modified silica-hafnia matrix. The chemical composition of thin films after UV and annealing treatments were studied using Fourier Transform Infrared Spectroscopy and X-Ray Photoelectron Spectroscopy. The study of optical properties revealed that the annealed films are transparent from 200 to 1000 nm and have a refractive index from 1.550 to 1.701 depending on the hafnium concentration.

Keywords: Photosensitivity; Thin Films; Sol-gel Deposition; Silica; Hafnia; X-ray photoelectron Spectroscopy; Diffraction gratings

Domains: Material chemistry; Materials

Janyce Franc, Vincent Barnier, Francis Vocanson, Émilie Gamet, Marilyne Lesage, et al.. Submicrometric gratings fabrication from photosensitive organo-silica-hafnia thin films elaborated by sol-gel processing. Thin Solid Films, 2012, 520 (19), pp.6050. ⟨10.1016/j.tsf.2012.03.093⟩. ⟨ujm-00681960⟩