Submicrometric gratings fabrication from photosensitive organo-silica-hafnia thin films elaborated by sol-gel processing - Archive ouverte HAL Access content directly
Journal Articles Thin Solid Films Year : 2012

Submicrometric gratings fabrication from photosensitive organo-silica-hafnia thin films elaborated by sol-gel processing

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Abstract

The aim of this study is the elaboration of a high index sol-gel material in order to prepare submicrometric grating. The gratings were obtained after few seconds of UV exposure in one step using an organically modified silica-hafnia matrix. The chemical composition of thin films after UV and annealing treatments were studied using Fourier Transform Infrared Spectroscopy and X-Ray Photoelectron Spectroscopy. The study of optical properties revealed that the annealed films are transparent from 200 to 1000 nm and have a refractive index from 1.550 to 1.701 depending on the hafnium concentration.
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ujm-00681960 , version 1 (23-03-2012)

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Janyce Franc, Vincent Barnier, Francis Vocanson, Émilie Gamet, Marilyne Lesage, et al.. Submicrometric gratings fabrication from photosensitive organo-silica-hafnia thin films elaborated by sol-gel processing. Thin Solid Films, 2012, 520 (19), pp.6050. ⟨10.1016/j.tsf.2012.03.093⟩. ⟨ujm-00681960⟩
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