Rehabilitation of wet etching for the low-cost manufacturing of highly selective subwavelength gratings of high efficiency,

S. Tonchev; Thomas Kampfe; O. Parriaux

Rehabilitation of wet etching for the low-cost manufacturing of highly selective subwavelength gratings of high efficiency,

S. Tonchev ^{1, 2} Thomas Kampfe ¹ O. Parriaux ¹

1 LHC - Laboratoire Hubert Curien [Saint Etienne]

2 ISSP - Institute for Solid State Physics [Tokyo]

Type de document :

Communication dans un congrès

2nd EOS Conference on Manufacturing of Optical Components (EOSMOC), Munich, Germany (2011), May 2011, Germany. 2011

Domaine :

Physique [physics] / Physique [physics] / Optique [physics.optics]

Liste complète des métadonnées

https://hal-ujm.archives-ouvertes.fr/ujm-00710933
Contributeur : Yves Jourlin <>
Soumis le : vendredi 22 juin 2012 - 09:07:34
Dernière modification le : samedi 1 décembre 2018 - 17:24:02

Rehabilitation of wet etching for the low-cost manufacturing of highly selective subwavelength gratings of high efficiency,

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Rehabilitation of wet etching for the low-cost manufacturing of highly selective subwavelength gratings of high efficiency,

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