Rehabilitation of wet etching for the low-cost manufacturing of highly selective subwavelength gratings of high efficiency,

S. Tonchev 1, 2 Thomas Kampfe 1 O. Parriaux 1
1 LHC - Laboratoire Hubert Curien [Saint Etienne]
2 ISSP - Institute for Solid State Physics
Type de document :
Communication dans un congrès
2nd EOS Conference on Manufacturing of Optical Components (EOSMOC), Munich, Germany (2011), May 2011, Germany. 2011
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https://hal-ujm.archives-ouvertes.fr/ujm-00710933
Contributeur : Yves Jourlin <>
Soumis le : vendredi 22 juin 2012 - 09:07:34
Dernière modification le : jeudi 11 janvier 2018 - 06:20:34

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  • HAL Id : ujm-00710933, version 1

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UNIV-ST-ETIENNE | LAHC

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S. Tonchev, Thomas Kampfe, O. Parriaux. Rehabilitation of wet etching for the low-cost manufacturing of highly selective subwavelength gratings of high efficiency,. 2nd EOS Conference on Manufacturing of Optical Components (EOSMOC), Munich, Germany (2011), May 2011, Germany. 2011. 〈ujm-00710933〉

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