Rehabilitation of wet etching for the low-cost manufacturing of highly selective subwavelength gratings of high efficiency,

S. Tonchev; Thomas Kampfe; O. Parriaux

Conference Papers Year : 2011

Rehabilitation of wet etching for the low-cost manufacturing of highly selective subwavelength gratings of high efficiency,

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S. Tonchev

Function : Author

Laboratoire Hubert Curien [Saint Etienne]

Institute for Solid State Physics [Tokyo]

Thomas Kampfe

Function : Author
PersonId : 885907

Laboratoire Hubert Curien [Saint Etienne]

O. Parriaux

Function : Author

Laboratoire Hubert Curien [Saint Etienne]

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Physics [physics] Physics [physics] Optics [physics.optics]

Yves Jourlin : Connect in order to contact the contributor

https://hal-ujm.archives-ouvertes.fr/ujm-00710933

Submitted on : Friday, June 22, 2012-9:07:34 AM

Last modification on : Wednesday, December 28, 2022-3:50:47 AM

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ujm-00710933 , version 1 (22-06-2012)

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HAL Id : ujm-00710933 , version 1

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S. Tonchev, Thomas Kampfe, O. Parriaux. Rehabilitation of wet etching for the low-cost manufacturing of highly selective subwavelength gratings of high efficiency,. 2nd EOS Conference on Manufacturing of Optical Components (EOSMOC), Munich, Germany (2011), May 2011, Germany. ⟨ujm-00710933⟩

Rehabilitation of wet etching for the low-cost manufacturing of highly selective subwavelength gratings of high efficiency,

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