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Rehabilitation of wet etching for the low-cost manufacturing of highly selective subwavelength gratings of high efficiency,

S. Tonchev 1, 2 Thomas Kampfe 1 O. Parriaux 1
1 LHC - Laboratoire Hubert Curien [Saint Etienne]
2 ISSP - Institute for Solid State Physics [Tokyo]
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Conference papers
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https://hal-ujm.archives-ouvertes.fr/ujm-00710933
Contributor : Yves Jourlin <>
Submitted on : Friday, June 22, 2012 - 9:07:34 AM
Last modification on : Monday, May 17, 2021 - 12:00:04 PM

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  • HAL Id : ujm-00710933, version 1

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UNIV-ST-ETIENNE | CNRS | LAHC | IOGS | PARISTECH | UDL

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S. Tonchev, Thomas Kampfe, O. Parriaux. Rehabilitation of wet etching for the low-cost manufacturing of highly selective subwavelength gratings of high efficiency,. 2nd EOS Conference on Manufacturing of Optical Components (EOSMOC), Munich, Germany (2011), May 2011, Germany. ⟨ujm-00710933⟩

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