Nanostructure formation upon femtosecond ablation from silicon: Effect of double pulses

J. Reif; O. Varlamova; M. Bounhalli; M. Muth; T. Arguirov

doi:10.1016/j.apsusc.2011.12.093

Journal Articles Applied Surface Science Year : 2012

Nanostructure formation upon femtosecond ablation from silicon: Effect of double pulses

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J. Reif

Function : Author

Brandenburg University of Technology [Cottbus – Senftenberg]

Cottbus Joint Lab

O. Varlamova

Function : Author

Brandenburg University of Technology [Cottbus – Senftenberg]

Cottbus Joint Lab

M. Bounhalli

Function : Author

Brandenburg University of Technology [Cottbus – Senftenberg]

Laboratoire Hubert Curien [Saint Etienne]

M. Muth

Function : Author

Brandenburg University of Technology [Cottbus – Senftenberg]

T. Arguirov

Function : Author

Cottbus Joint Lab

Domains

Engineering Sciences [physics] Optics / Photonic

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https://hal-ujm.archives-ouvertes.fr/ujm-00738935

Submitted on : Friday, October 5, 2012-1:53:31 PM

Last modification on : Wednesday, December 28, 2022-3:50:49 AM

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ujm-00738935 , version 1 (05-10-2012)

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HAL Id : ujm-00738935 , version 1
DOI : 10.1016/j.apsusc.2011.12.093

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J. Reif, O. Varlamova, M. Bounhalli, M. Muth, T. Arguirov. Nanostructure formation upon femtosecond ablation from silicon: Effect of double pulses. Applied Surface Science, 2012, 258 (23), pp.9491-9495. ⟨10.1016/j.apsusc.2011.12.093⟩. ⟨ujm-00738935⟩

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Nanostructure formation upon femtosecond ablation from silicon: Effect of double pulses

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