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Direct nanopatterning of 100 nm metal oxide periodic structures by Deep-UV immersion lithography

Fabrice Stehlin 1 y. Bourgin 2 Arnaud Spangenberg 1 yves Jourlin 2 O. Parriaux 2 Stéphanie Reynaud 2 Fernand Wieder 1 Olivier Soppera 1 
1 IS2M - Institut de Science des Matériaux de Mulhouse
2 LHC - Laboratoire Hubert Curien [Saint Etienne]
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https://hal-ujm.archives-ouvertes.fr/ujm-00749634
Contributor : Yves Jourlin Connect in order to contact the contributor
Submitted on : Wednesday, November 7, 2012 - 10:15:48 PM
Last modification on : Saturday, June 25, 2022 - 7:26:05 PM

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  • HAL Id : ujm-00749634, version 1

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UNIV-ST-ETIENNE | CNRS | LAHC | SITE-ALSACE | UDL

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Fabrice Stehlin, y. Bourgin, Arnaud Spangenberg, yves Jourlin, O. Parriaux, et al.. Direct nanopatterning of 100 nm metal oxide periodic structures by Deep-UV immersion lithography. Optics Letters, Optical Society of America - OSA Publishing, 2012, 37 (22), pp.4651-4653. ⟨ujm-00749634⟩

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