Influence of magnetron effect on barium hexaferrite thin layers

Abstract : In this paper, we study the effects of a magnet, located in the cathode, on barium hexaferrite thin films deposited by RF magnetron sputtering technique. During the process, these effects can modify thickness, roughness and stress of coatings. The characteristics of the deposited layers depend on the substrate position that is located opposite of magnetron cathode. In the "magnetron area", one can observe that the high stress can produce cracks or detachment of layers and the increasing of both depositing rate and surface roughness. After sputtering elaboration, barium hexaferrite films are in a compressive stress mode. But, after the post-deposition heat treatment these films are in a tensile stress mode. To improve the quality of BaM films, the subsrtate has to be set outside the magnetron area.
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Advanced Materials Research, Trans Tech Publications, 2011, 324, pp.97-100. 〈10.4028/www.scientific.net/AMR.324.97〉
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Contributeur : Jean-Pierre Chatelon <>
Soumis le : mardi 19 février 2013 - 10:51:33
Dernière modification le : dimanche 15 octobre 2017 - 22:44:13

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Harouna Hassane, Jean-Pierre Chatelon, Jean-Jacques Rousseau, A. Siblini, Adoum Kriga. Influence of magnetron effect on barium hexaferrite thin layers. Advanced Materials Research, Trans Tech Publications, 2011, 324, pp.97-100. 〈10.4028/www.scientific.net/AMR.324.97〉. 〈ujm-00789981〉

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