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Influence of argon flow rate on YIG film deposited by Radio-frequency reactive magnetron sputtering

B. Abdel Samad 1 M.-F. Blanc-Mignon 1 Mohamad Roumie 2 Jean-Pierre Chatelon 3 A. Siblini 1 Damien Jamon 1 M. Korek 
1 DIOM - Dispositifs et Instrumentation en Optoélectronique et micro-ondes
2 Lebanese Atomic Energy Commission
3 LT2C - Laboratoire Telecom Claude Chappe
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Conference papers
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https://hal-ujm.archives-ouvertes.fr/ujm-00795868
Contributor : Jean-Pierre Chatelon Connect in order to contact the contributor
Submitted on : Friday, March 1, 2013 - 9:33:49 AM
Last modification on : Thursday, November 21, 2019 - 2:21:07 AM

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  • HAL Id : ujm-00795868, version 1

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UNIV-ST-ETIENNE | UDL

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B. Abdel Samad, M.-F. Blanc-Mignon, Mohamad Roumie, Jean-Pierre Chatelon, A. Siblini, et al.. Influence of argon flow rate on YIG film deposited by Radio-frequency reactive magnetron sputtering. Seeheim Conference on Magnetism, Mar 2010, Frankfurt, Germany. ⟨ujm-00795868⟩

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