Influence of argon flow rate on YIG film deposited by Radio-frequency reactive magnetron sputtering

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https://hal-ujm.archives-ouvertes.fr/ujm-00795868
Contributor : Jean-Pierre Chatelon <>
Submitted on : Friday, March 1, 2013 - 9:33:49 AM
Last modification on : Sunday, October 15, 2017 - 10:44:13 PM

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  • HAL Id : ujm-00795868, version 1

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B. Abdel Samad, M.-F. Blanc-Mignon, Mohamad Roumie, Jean-Pierre Chatelon, A. Siblini, et al.. Influence of argon flow rate on YIG film deposited by Radio-frequency reactive magnetron sputtering. Seeheim Conference on Magnetism, Mar 2010, Frankfurt, Germany. ⟨ujm-00795868⟩

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