The effect of oxygen flow rate on the properties of YIG thin films prepared by rf-magnetron sputtering

B. Abdel Samad 1 A. Siblini 1 M.-F. Blanc-Mignon 1 Mohamad Roumie 2 Jean-Pierre Chatelon 1 M. Korek
1 LT2C - Laboratoire Telecom Claude Chappe
2 Lebanese Atomic Energy Commission
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https://hal-ujm.archives-ouvertes.fr/ujm-00795876
Contributor : Jean-Pierre Chatelon <>
Submitted on : Friday, March 1, 2013 - 9:42:16 AM
Last modification on : Sunday, October 15, 2017 - 10:44:13 PM

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  • HAL Id : ujm-00795876, version 1

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B. Abdel Samad, A. Siblini, M.-F. Blanc-Mignon, Mohamad Roumie, Jean-Pierre Chatelon, et al.. The effect of oxygen flow rate on the properties of YIG thin films prepared by rf-magnetron sputtering. Mediterranean Conference on Innovative Materials and Applications (CIMA), Mar 2011, Beirut, Lebanon. ⟨ujm-00795876⟩

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