The effect of oxygen flow rate on the properties of YIG thin films prepared by rf-magnetron sputtering

B. Abdel Samad; A. Siblini; M.-F. Blanc-Mignon; Mohamad Roumie; Jean-Pierre Chatelon; M. Korek

Conference papers

The effect of oxygen flow rate on the properties of YIG thin films prepared by rf-magnetron sputtering

B. Abdel Samad ¹ A. Siblini ¹ M.-F. Blanc-Mignon ¹ Mohamad Roumie ² Jean-Pierre Chatelon ¹ M. Korek

1 LT2C - Laboratoire Telecom Claude Chappe

2 Lebanese Atomic Energy Commission

Document type :

Conference papers

Domain :

Engineering Sciences [physics] / Micro and nanotechnologies/Microelectronics

Complete list of metadatas

https://hal-ujm.archives-ouvertes.fr/ujm-00795876
Contributor : Jean-Pierre Chatelon <>
Submitted on : Friday, March 1, 2013 - 9:42:16 AM
Last modification on : Thursday, November 21, 2019 - 2:35:54 AM

The effect of oxygen flow rate on the properties of YIG thin films prepared by rf-magnetron sputtering

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The effect of oxygen flow rate on the properties of YIG thin films prepared by rf-magnetron sputtering

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