Femtosecond multi-beam interference lithography based on dynamic wavefront engineering - Université Jean-Monnet-Saint-Étienne Access content directly
Journal Articles Optics Express Year : 2013

Femtosecond multi-beam interference lithography based on dynamic wavefront engineering

Abstract

A method for precise multi-spot parallel ultrafast laser material structuring is presented based on multi-beam interference generated by dynamic spatial phase engineering. A Spatial Light Modulator (SLM) and digitally programming of phase masks are used to accomplish the function of a multi-facet pyramid lens, so that the laser beam can be spatially modulated to create beam multiplexing and desired two-dimensional (2D) multi-beam interference patterns. Various periodic microstructures on metallic alloy surfaces are fabricated with this tech nique. A method of preparing extended scale periodic microstructures by load ing dynamic time-varying phases is also demonstrated. Scanning electron microscopy (SEM) reveals the period and morphology of the microstructures created using this technique. The asymmetry of interference modes generated from the beams with asymmetric wave vector distributions is equally explored. The flexibility of programming the period of the microstructures is demonstrated.

Dates and versions

ujm-00812866 , version 1 (12-04-2013)

Identifiers

Cite

Qiang Zhou, Wenzheng Yang, Fengtao He, Razvan Stoian, Rongqing Hui, et al.. Femtosecond multi-beam interference lithography based on dynamic wavefront engineering. Optics Express, 2013, 21 (8), pp.9851. ⟨10.1364/OE.21.009851⟩. ⟨ujm-00812866⟩
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