Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist. - Université Jean-Monnet-Saint-Étienne Access content directly
Journal Articles Optical Materials Year : 2013
Not file

Dates and versions

ujm-00842557 , version 1 (08-07-2013)

Identifiers

Cite

V. Gâté, Yves Jourlin, Francis Vocanson, O. Dellea, G. Vercasson, et al.. Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist.. Optical Materials, 2013, 35, pp.1706. ⟨10.1016/j.optmat.2013.05.010⟩. ⟨ujm-00842557⟩
99 View
0 Download

Altmetric

Share

Gmail Facebook Twitter LinkedIn More