Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist.

V. Gâté ^{1, 2} AuthorId : 624713
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Yves Jourlin ¹ AuthorId : 384459
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Francis Vocanson ¹ AuthorId : 377539
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O. Dellea ³ AuthorId : 629745
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G. Vercasson ¹ AuthorId : 868018
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S. Reynaud ¹ AuthorId : 1096232
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Author IdHAL : serge-reynaud arXiv : https://arxiv.org/a/reynaud_s_1 ResearcherId : http://www.researcherid.com/rid/J-8061-2014 ORCID : https://orcid.org/0000-0002-1494-696X

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Michel Langlet ² AuthorId : 868019
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