Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist.

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https://hal-ujm.archives-ouvertes.fr/ujm-00842557
Contributor : Francis Vocanson <>
Submitted on : Monday, July 8, 2013 - 5:12:42 PM
Last modification on : Monday, October 7, 2019 - 5:24:45 PM

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V. Gâté, Yves Jourlin, Francis Vocanson, O. Dellea, G. Vercasson, et al.. Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist.. Optical Materials, Elsevier, 2013, 35, pp.1706. ⟨10.1016/j.optmat.2013.05.010⟩. ⟨ujm-00842557⟩

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