Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist.

V. Gâté; Yves Jourlin; Francis Vocanson; O. Dellea; G. Vercasson; S. Reynaud; D. Riassetto; Michel Langlet

doi:10.1016/j.optmat.2013.05.010

Journal articles

Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist.

V. Gâté ^{1, 2} Yves Jourlin ¹ Francis Vocanson ¹ O. Dellea ³ G. Vercasson ¹ S. Reynaud ¹ D. Riassetto ² Michel Langlet ^{2, *}

* Corresponding author

1 LHC - Laboratoire Hubert Curien [Saint Etienne]

2 LMGP - Laboratoire des matériaux et du génie physique

3 LITEN - Laboratoire d'Innovation pour les Technologies des Energies Nouvelles et les nanomatériaux

Document type :

Journal articles

Domain :

Engineering Sciences [physics] / Materials

Engineering Sciences [physics] / Optics / Photonic

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https://hal-ujm.archives-ouvertes.fr/ujm-00842557
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Submitted on : Monday, July 8, 2013 - 5:12:42 PM
Last modification on : Tuesday, September 27, 2022 - 4:39:49 AM

Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist.

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Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist.

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