Resonant TE Transmission Through a Continuous Metal Film: Perspectives for Low-Loss Plasmonic Elements

S. Tonchev 1 O. Parriaux 1 T. Tenev 2 I. Miloushev 2 D. Troadec 3 G. Patriarche 4
1 LHC - Laboratoire Hubert Curien [Saint Etienne]
2 ISSP - Institut of the Solid State Physics
3 IEMN - Institut d’Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520
4 LPN - Laboratoire de photonique et de nanostructures
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Journal articles
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https://hal-ujm.archives-ouvertes.fr/ujm-00864880
Contributor : Yves Jourlin <>
Submitted on : Monday, September 23, 2013 - 2:24:25 PM
Last modification on : Tuesday, November 19, 2019 - 2:46:44 AM

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UNIV-ST-ETIENNE | CNRS | LAHC | UNIV-LILLE | IOGS | PARISTECH | UNIV-VALENCIENNES

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S. Tonchev, O. Parriaux, T. Tenev, I. Miloushev, D. Troadec, et al.. Resonant TE Transmission Through a Continuous Metal Film: Perspectives for Low-Loss Plasmonic Elements. Plasmonics, Springer Verlag, 2013, 8 (2), pp.829-833. ⟨10.1007/s11468-013-9479-0⟩. ⟨ujm-00864880⟩

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