Resonant TE Transmission Through a Continuous Metal Film: Perspectives for Low-Loss Plasmonic Elements

S. Tonchev; O. Parriaux; T. Tenev; I. Miloushev; David Troadec; G. Patriarche

doi:10.1007/s11468-013-9479-0

Journal Articles Plasmonics Year : 2013

Resonant TE Transmission Through a Continuous Metal Film: Perspectives for Low-Loss Plasmonic Elements

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S. Tonchev

Function : Author

Laboratoire Hubert Curien

O. Parriaux

Function : Author

Laboratoire Hubert Curien

T. Tenev

Function : Author

Institut of the Solid State Physics

I. Miloushev

Function : Author

Institut of the Solid State Physics

David Troadec

Function : Author
PersonId : 745527
IdHAL : david-troadec
IdRef : 059727403

Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520

G. Patriarche

Function : Author
PersonId : 749659
IdHAL : gilles-patriarche
ORCID : 0000-0002-3917-2470
IdRef : 085221872

Laboratoire de photonique et de nanostructures

Domains

Optics [physics.optics]

Yves Jourlin : Connect in order to contact the contributor

https://hal-ujm.archives-ouvertes.fr/ujm-00864880

Submitted on : Monday, September 23, 2013-2:24:25 PM

Last modification on : Friday, March 24, 2023-2:52:57 PM

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ujm-00864880 , version 1 (23-09-2013)

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HAL Id : ujm-00864880 , version 1
DOI : 10.1007/s11468-013-9479-0

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S. Tonchev, O. Parriaux, T. Tenev, I. Miloushev, David Troadec, et al.. Resonant TE Transmission Through a Continuous Metal Film: Perspectives for Low-Loss Plasmonic Elements. Plasmonics, 2013, 8 (2), pp.829-833. ⟨10.1007/s11468-013-9479-0⟩. ⟨ujm-00864880⟩

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Resonant TE Transmission Through a Continuous Metal Film: Perspectives for Low-Loss Plasmonic Elements

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