Single-shot high aspect ratio bulk nanostructuring of fused silica using chirp-controlled ultrafast laser Bessel beams - Université Jean-Monnet-Saint-Étienne Access content directly
Journal Articles Applied Physics Letters Year : 2014

Single-shot high aspect ratio bulk nanostructuring of fused silica using chirp-controlled ultrafast laser Bessel beams

Praveen Kumar Velpula
Jean-Philippe Colombier
Razvan Stoian

Abstract

We report single-shot, high aspect ratio nanovoid fabrication in bulk fused silica using zeroth order chirp-controlled ultrafast laser Bessel beams. We identify a unique laser pulse length and energy dependence of the physical characteristics of machined structures over which nanovoids of diameter in the range 200-400 nm and aspect ratios exceeding 1000 can be fabricated. A mechanism based on the axial energy deposition of nonlinear ultrashort Bessel beams and subsequent material densification or rarefaction in fused silica is proposed, intricating the non-diffractive nature with the diffusing character of laser-generated free carriers. Fluid flow through nanochannel is also demonstrated

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Dates and versions

ujm-00931776 , version 1 (15-01-2014)

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Cite

Manoj Bhuyan, Praveen Kumar Velpula, Jean-Philippe Colombier, Thomas Olivier, Nicolas Faure, et al.. Single-shot high aspect ratio bulk nanostructuring of fused silica using chirp-controlled ultrafast laser Bessel beams. Applied Physics Letters, 2014, 104 (2), pp.021107. ⟨10.1063/1.4861899⟩. ⟨ujm-00931776⟩
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