 |
Université Jean Monnet – Saint-Etienne |  |
Journal articles
Enhanced Radiation Induced Narrow Channel Effects in a Commercial 0.18 µm Bulk Technology
Abstract : otal ionizing dose effects are investigated in input/output transistors that are fabricated by using a commercial 0.18 μm bulk process. An enhanced radiation-induced narrow channel effect is demonstrated in N-type metal-oxide semiconductor (NMOS) and P-type metal-oxide semiconductor (PMOS) transistors, leading to a significant threshold voltage shift which may compromise circuit operations. Calculations using a code dedicated to radiation-induced charge trapping in oxides show that the radiation-induced positive charge trapping in trench oxides leads to the modifications of the electrical characteristics experimentally evidenced. Radiation hardening issues are finally discussed as a function of the device geometry and design.
https://hal-ujm.archives-ouvertes.fr/ujm-01011678
Contributor : Sylvain Girard <>
Submitted on : Tuesday, June 24, 2014 - 12:11:03 PM
Last modification on : Tuesday, November 19, 2019 - 12:58:36 PM
Contributor : Sylvain Girard <>
Submitted on : Tuesday, June 24, 2014 - 12:11:03 PM
Last modification on : Tuesday, November 19, 2019 - 12:58:36 PM