Enhanced Radiation Induced Narrow Channel Effects in a Commercial 0.18 µm Bulk Technology

M. Gaillardin 1 Vincent Goiffon 2 Sylvain Girard 1 M. Martinez 1 Pierre Magnan 2 P. Paillet 1
1 DAM/DIF - DAM Île-de-France
2 DEOS - Département Electronique, Optronique et Signal
Abstract : otal ionizing dose effects are investigated in input/output transistors that are fabricated by using a commercial 0.18 μm bulk process. An enhanced radiation-induced narrow channel effect is demonstrated in N-type metal-oxide semiconductor (NMOS) and P-type metal-oxide semiconductor (PMOS) transistors, leading to a significant threshold voltage shift which may compromise circuit operations. Calculations using a code dedicated to radiation-induced charge trapping in oxides show that the radiation-induced positive charge trapping in trench oxides leads to the modifications of the electrical characteristics experimentally evidenced. Radiation hardening issues are finally discussed as a function of the device geometry and design.
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Article dans une revue
IEEE Transactions on Nuclear Science, Institute of Electrical and Electronics Engineers, 2011, 58 (6), pp.2807 - 2815. 〈10.1109/TNS.2011.2170854〉
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https://hal-ujm.archives-ouvertes.fr/ujm-01011678
Contributeur : Sylvain Girard <>
Soumis le : mardi 24 juin 2014 - 12:11:03
Dernière modification le : lundi 15 octobre 2018 - 15:54:03

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CEA | UNIV-ST-ETIENNE | DAM

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M. Gaillardin, Vincent Goiffon, Sylvain Girard, M. Martinez, Pierre Magnan, et al.. Enhanced Radiation Induced Narrow Channel Effects in a Commercial 0.18 µm Bulk Technology. IEEE Transactions on Nuclear Science, Institute of Electrical and Electronics Engineers, 2011, 58 (6), pp.2807 - 2815. 〈10.1109/TNS.2011.2170854〉. 〈ujm-01011678〉

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