Influence of photo-inscription conditions on the radiation-response of fiber Bragg gratings
Abstract
We compared the sensitivity to X-rays of several fiber Bragg gratings (FBGs) written in the standard telecommunication fiber Corning SMF28 with different techniques. Standard gratings were manufactured with phase-mask and UV lasers, continuum wave (cw) at 244 nm or pulsed in the nanosecond domain at 248 nm, in a pre-hydrogenated fiber. Others gratings were written by exposures to a femtosecond IR-laser (800 nm), with both phase-mask and point by point techniques. The response of these FBGs was studied under X-rays at room temperature and 100°C, by highlighting their similarities and differences. Independently of the inscription technique, the two types of fs-FBGs have showed no big difference up to 1 MGy(SiO2) dose. A discussion on the causes of the radiation-induced peak change is also reported.