28nm node process optimization: A Lithographic Centric View, Proc. of SPIE 9231, 2014. ,
Scanner correction capabilities aware CMP / Lithography hotspot analysis, Proc. of SPIE, vol.9053, p.2014 ,
Hotspot Detection and Design Recommendation Using Silicon Calibrated CMP Model, Proc. of SPIE, 2009. ,
Focus control budget analysis for critical layers of flash devices, Proc. of SPIE, vol.9050, p.2014 ,
A new paradigm for inline detection and control of patterning defects, Proc. Of SPIE, vol.9424, p.2015 ,
High resolution nanotopography characterization at die scale of 28nm FDSOI CMOS front-end CMP processes, Microelectronic Eng, pp.105-108, 2014. ,
DOI : 10.1016/j.mee.2013.08.001