Verification and application of multi-source focus quantification

Abstract : The concept of the multi-source focus correlation method was presented in 2015 [1, 2]. A more accurate understanding of real on-product focus can be obtained by gathering information from different sectors: design, scanner short loop monitoring, scanner leveling, on-product focus and topography. This work will show that chip topography can be predicted from reticle density and perimeter density data, including experimental proof.Different pixel sizes are used to perform the correlation in-line with the minimum resolution, correlation length of CMP effects and the spot size of the scanner level sensor.Potential applications of the topography determination will be evaluated, includingoptimizing scanner leveling by ignoring non-critical parts of the field, and without the need for time-consuming offline topography measurements.
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Communication dans un congrès
SPIE Advanced Lithography 2016, Feb 2016, San José, CA, United States. Proceedings of SPIE
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Contributeur : Jean-Gabriel Simiz <>
Soumis le : mardi 16 février 2016 - 14:18:48
Dernière modification le : jeudi 26 juillet 2018 - 01:10:43
Document(s) archivé(s) le : mardi 17 mai 2016 - 10:05:00

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  • HAL Id : ujm-01272860, version 1

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J-G Simiz, T Hasan, F Staals, B Le-Gratiet, Wim Tel, et al.. Verification and application of multi-source focus quantification. SPIE Advanced Lithography 2016, Feb 2016, San José, CA, United States. Proceedings of SPIE. 〈ujm-01272860〉

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