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Journal articles
Efficient reversible phase mask for TiO2 submicron gratings directly printed on cylindrical surfaces
Loic Berthod
1
M. Bichotte
1
Isabelle Verrier
1
C Veillas
1
Thomas Kampfe
1
Francis Vocanson
1, 2
J. Laukkanen
3
Michel Langlet
4
Olivier Parriaux
1
Y. Jourlin
1, *
Thomas Kampfe 1
Author
Francis Vocanson 1, 2
Author
J. Laukkanen 3
Author
Michel Langlet 4
Author IdHAL : michel-langlet arXiv : https://arxiv.org/a/m langlet VIAF : https://viaf.org/viaf/michel langlet
Olivier Parriaux 1
Author
Y. Jourlin 1
Correspondent author
1
LHC - Laboratoire Hubert Curien [Saint Etienne] (18 rue du Professeur Lauras 42000 SAINT-ETIENNE - France)
- UJM - Université Jean Monnet [Saint-Étienne] (10 rue Tréfilerie - 42100 Saint-Étienne - France)
- CNRS - Centre National de la Recherche Scientifique : UMR5516 (France)
- IOGS - Institut d'Optique Graduate School (2 avenue Augustin Fresnel, 91127 Palaiseau Cedex - France)
2
Université de Lyon (92 rue Pasteur - CS 30122, 69361 Lyon Cedex 07 - France)
3
University of Eastern Finland ( Educa, Tulliportinkatu 1, 80130 Joensuu, Finland - Finland)
4
LMGP - Laboratoire des matériaux et du génie physique (Grenoble INP Minatec - 3 parvis Louis Néel - CS 50257- 38016 Grenoble Cedex 1 - France)
- INPG - Institut National Polytechnique de Grenoble (46 avenue Félix Viallet 38031 Grenoble Cedex 1 - France)
- Grenoble INP - Institut polytechnique de Grenoble - Grenoble Institute of Technology (46 avenue Félix Viallet 38031 Grenoble Cedex 1 - France)
- INC - Institut de Chimie du CNRS (3 Rue Michel-Ange 75 016 Paris - France)
- CNRS - Centre National de la Recherche Scientifique : UMR5628 (France)
Abstract : In this article we present a radial phase mask specially designed and manufactured for direct micro-structuration under UV photolithography of a cylindrical surface covered by a photoresist TiO2 film. The period of the phase mask is sub-micron (between 480 nm and 720 nm) and allows direct printing on several types of cylindrical components. With this dedicated reversible phase mask we have demonstrated the feasibility of a TiO2 grating with a period of 960 nm, printed on a SiO2 cylinder or inside a SiO2 tube of 8 mm diameter.
Document type :
Journal articles
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https://hal-ujm.archives-ouvertes.fr/ujm-01514950
Contributor : F Vocanson Connect in order to contact the contributor
Submitted on : Wednesday, April 26, 2017 - 6:21:49 PM
Last modification on : Friday, January 7, 2022 - 8:56:24 AM
Contributor : F Vocanson Connect in order to contact the contributor
Submitted on : Wednesday, April 26, 2017 - 6:21:49 PM
Last modification on : Friday, January 7, 2022 - 8:56:24 AM
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Identifiers
- HAL Id : ujm-01514950, version 1
- DOI : 10.1364/OE.25.009003
Citation
Loic Berthod, M. Bichotte, Isabelle Verrier, C Veillas, Thomas Kampfe, et al.. Efficient reversible phase mask for TiO2 submicron gratings directly printed on cylindrical surfaces. Optics Express, Optical Society of America - OSA Publishing, 2017, 25 (8), pp.9003. ⟨10.1364/OE.25.009003⟩. ⟨ujm-01514950⟩
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