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Journal Articles Optics Express Year : 2017

Efficient reversible phase mask for TiO2 submicron gratings directly printed on cylindrical surfaces

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Abstract

In this article we present a radial phase mask specially designed and manufactured for direct micro-structuration under UV photolithography of a cylindrical surface covered by a photoresist TiO2 film. The period of the phase mask is sub-micron (between 480 nm and 720 nm) and allows direct printing on several types of cylindrical components. With this dedicated reversible phase mask we have demonstrated the feasibility of a TiO2 grating with a period of 960 nm, printed on a SiO2 cylinder or inside a SiO2 tube of 8 mm diameter.

Dates and versions

ujm-01514950 , version 1 (26-04-2017)

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Cite

Loic Berthod, M. Bichotte, Isabelle Verrier, C Veillas, Thomas Kampfe, et al.. Efficient reversible phase mask for TiO2 submicron gratings directly printed on cylindrical surfaces. Optics Express, 2017, 25 (8), pp.9003. ⟨10.1364/OE.25.009003⟩. ⟨ujm-01514950⟩
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