Efficient reversible phase mask for TiO2 submicron gratings directly printed on cylindrical surfaces

Loic Berthod (1) , M. Bichotte (1) , Isabelle Verrier (1) , C Veillas (1) , Thomas Kampfe (1) , Francis Vocanson (1, 2) , J. Laukkanen (3) , Michel Langlet (4) , Olivier Parriaux (1) , Y. Jourlin (1)

1 LHC - Laboratoire Hubert Curien [Saint Etienne]
2 Université de Lyon
3 University of Eastern Finland
4 LMGP - Laboratoire des matériaux et du génie physique

In this article we present a radial phase mask specially designed and manufactured for direct micro-structuration under UV photolithography of a cylindrical surface covered by a photoresist TiO2 film. The period of the phase mask is sub-micron (between 480 nm and 720 nm) and allows direct printing on several types of cylindrical components. With this dedicated reversible phase mask we have demonstrated the feasibility of a TiO2 grating with a period of 960 nm, printed on a SiO2 cylinder or inside a SiO2 tube of 8 mm diameter.

Domains: Engineering Sciences [physics]; Optics / Photonic; Engineering Sciences [physics]; Materials

Loic Berthod, M. Bichotte, Isabelle Verrier, C Veillas, Thomas Kampfe, et al.. Efficient reversible phase mask for TiO2 submicron gratings directly printed on cylindrical surfaces. Optics Express, 2017, 25 (8), pp.9003. ⟨10.1364/OE.25.009003⟩. ⟨ujm-01514950⟩