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Efficient reversible phase mask for TiO2 submicron gratings directly printed on cylindrical surfaces

Abstract : In this article we present a radial phase mask specially designed and manufactured for direct micro-structuration under UV photolithography of a cylindrical surface covered by a photoresist TiO2 film. The period of the phase mask is sub-micron (between 480 nm and 720 nm) and allows direct printing on several types of cylindrical components. With this dedicated reversible phase mask we have demonstrated the feasibility of a TiO2 grating with a period of 960 nm, printed on a SiO2 cylinder or inside a SiO2 tube of 8 mm diameter.
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https://hal-ujm.archives-ouvertes.fr/ujm-01514950
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Submitted on : Wednesday, April 26, 2017 - 6:21:49 PM
Last modification on : Friday, January 7, 2022 - 8:56:24 AM

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Loic Berthod, M. Bichotte, Isabelle Verrier, C Veillas, Thomas Kampfe, et al.. Efficient reversible phase mask for TiO2 submicron gratings directly printed on cylindrical surfaces. Optics Express, Optical Society of America - OSA Publishing, 2017, 25 (8), pp.9003. ⟨10.1364/OE.25.009003⟩. ⟨ujm-01514950⟩

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