Efficient reversible phase mask for TiO2 submicron gratings directly printed on cylindrical surfaces

Abstract : In this article we present a radial phase mask specially designed and manufactured for direct micro-structuration under UV photolithography of a cylindrical surface covered by a photoresist TiO2 film. The period of the phase mask is sub-micron (between 480 nm and 720 nm) and allows direct printing on several types of cylindrical components. With this dedicated reversible phase mask we have demonstrated the feasibility of a TiO2 grating with a period of 960 nm, printed on a SiO2 cylinder or inside a SiO2 tube of 8 mm diameter.