Direct UV micro-structuring process of dielectric TiO2 and metallic TiOxNy from sol-gel layers

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https://hal-ujm.archives-ouvertes.fr/ujm-01919794
Contributor : Francis Vocanson <>
Submitted on : Monday, November 12, 2018 - 5:03:48 PM
Last modification on : Thursday, August 1, 2019 - 11:43:39 AM

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  • HAL Id : ujm-01919794, version 1

Citation

Francis Vocanson, N Crespo-Monteiro, Michel Langlet, Loic Berthod, Olivier Dellea, et al.. Direct UV micro-structuring process of dielectric TiO2 and metallic TiOxNy from sol-gel layers. E-MRS 2018, Spring Meeting, symposium P, Solution processing and properties of functional oxide thin films and nanostructures III, Jun 2018, Strasbourg, France. ⟨ujm-01919794⟩

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