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Article Dans Une Revue Applied Physics Letters Année : 2019

Plasma formation and relaxation dynamics in fused silica driven by femtosecond short-wavelength infrared laser pulses

Résumé

Laser-induced plasma formation and subsequent relaxation in solid dielectrics is the precursor to structural modifications that are accompanied by a permanent alteration of material properties. The decay of the electron-hole plasma through distinct relaxation channels determines the properties of the resulting modification. Based on an experimental arrangement combining a time-resolved transmission measurement with a cross-phase modulation measurement, we isolate the plasma formation and relaxation dynamics in the bulk of amorphous fused silica excited by femtosec-ond short-wavelength infrared (λ = 2100 nm) laser pulses. Whereas the relaxation time of the generated electron-hole plasma was so far assumed to be constant, our findings indicate an intensity-dependent relaxation time. We attribute this intensity dependence to vibrational detrapping of self-trapped excitons.
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Dates et versions

ujm-02354599 , version 1 (18-11-2020)

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P. Jürgens, M. Vrakking, R. Stoian, A. Mermillod-Blondin. Plasma formation and relaxation dynamics in fused silica driven by femtosecond short-wavelength infrared laser pulses. Applied Physics Letters, 2019, 115 (19), pp.191903. ⟨10.1063/1.5117837⟩. ⟨ujm-02354599⟩
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