Nanosphere Photolithography: The Influence of Nanopore Arrays Disorder on Extraordinary Optical Transmission

Andrei Ushkov (1, 2) , Olivier Dellea (3) , Isabelle Verrier (1) , Thomas Kampfe (1) , Alexey Shcherbakov (2, 4) , Jean-Yves Michalon (1) , Yves Jourlin (1)

1 LHC - Laboratoire Hubert Curien
2 MIPT - Moscow Institute of Physics and Technology [Moscow]
3 CEA-Grenoble
4 ITMO Univiversity

We analyze both experimentally and numerically the influence of nanopore arrays disorder on extraordinary optical transmission in samples, fabricated via nanosphere photolithography. Two measures of disorder are considered, the correlations between them are discussed using experimental and numerical data. We propose a theoretical model which takes explicitly the disorder into account, and show how the concurrence between nanopore depth and disorder level defines the quality of EOT excitation. Simulated spectra are in a good agreement with experimental ones. Our results reveal the possibilities of NPL for EOT-based applications and pave the way toward plasmonic devices with a polycrystalline design.

Mots clés: Nanosphere Photolithohraphy; NPL; Extraordinary Optical Transmission; EOT; Disorder; Nanopore Array; Diffraction Graing; Plasmonics; Numerical Simulations

Domaines: Optique [physics.optics]; Sciences de l'ingénieur [physics]

Andrei Ushkov, Olivier Dellea, Isabelle Verrier, Thomas Kampfe, Alexey Shcherbakov, et al.. Nanosphere Photolithography: The Influence of Nanopore Arrays Disorder on Extraordinary Optical Transmission. 9th International Conference on Photonics, Optics and Laser Technology (PHOTOPTICS), Feb 2021, on-line conference, Austria. pp.46-53, ⟨10.5220/0010344400460053⟩. ⟨ujm-03142790⟩