Fabrication of resonant grating pulse compression element with 99 % flat top efficiency for high average power femtosecond laser machining

Olivier Parriaux (1) , Renate Fechner (2) , Manuel Flury (1) , Svetlen Tonchev (1) , Nikolay Lyndin (1) , Axel Schindler (2)

1 LHC - Laboratoire Hubert Curien
2 IOM - Institut für Oberflächenmodifizierung

Top hat diffraction efficiency in an all-dielectric SiO2/HfO2 grating femtosecond pulse compression grating is demonstrated with a close to 100% flat top over more than 20 nm around 800 nm wavelength. New perspectives are open for high average power femtosecond laser machining. The Poster shows the design, fabrication and the diffraction efficiency results of the element focusing on the fabrication details

Domaines: Optique / photonique

Olivier Parriaux, Renate Fechner, Manuel Flury, Svetlen Tonchev, Nikolay Lyndin, et al.. Fabrication of resonant grating pulse compression element with 99 % flat top efficiency for high average power femtosecond laser machining. 108. JAHRESTAGUNG - DGa0 2007 annual meeting, May 2007, Ostseebad-Heringsdorf, Germany. pp.P44. ⟨ujm-00161518⟩