The effect of deposition and annealing conditions on crystallographic properties of sputter barium ferrite thick films

B. Bayard 1 Jean-Pierre Chatelon 1 M. Le Berre 2 H. Joisten 3 J.J. Rousseau 1 D. Barbier 2
1 DIOM - Dispositifs et Instrumentation en Optoélectronique et micro-ondes
2 LPM - Laboratoire de physique de la matière
3 CEA-LETI - Laboratoire d'Electronique et des Technologies de l'Information
Document type :
Journal articles
Complete list of metadatas
https://hal-ujm.archives-ouvertes.fr/ujm-00356482
Contributor : Jean-Pierre Chatelon <>
Submitted on : Tuesday, January 27, 2009 - 3:43:43 PM
Last modification on : Monday, February 25, 2019 - 4:34:17 PM

Identifiers

  • HAL Id : ujm-00356482, version 1

Collections

CEA | UNIV-ST-ETIENNE | CNRS | INSA-LYON | DRT | LETI | INSA-GROUPE | CEA-GRE

Citation

B. Bayard, Jean-Pierre Chatelon, M. Le Berre, H. Joisten, J.J. Rousseau, et al.. The effect of deposition and annealing conditions on crystallographic properties of sputter barium ferrite thick films. Sensors and Actuators A: Physical , Elsevier, 2002, 99 (1-2), pp.207-212. ⟨ujm-00356482⟩

Export

BibTeX TEI DC DCterms EndNote

Share

Metrics

Record views

136

Contact

CCSD