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Journal Articles Microelectronic Engineering Year : 2006

Flying phase mask for the printing of long submicron-period stitchingless gratings

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Abstract

Long and stitchingless gratings are printed by means of a read/write head comprising a phase mask illuminated by an intensity modulated laser beam and a reference grating displacement sensor which dictates the modulation period real time. A nearly perfect grating copying is achieved by fixing the sensor grating scale and the written grating substrate on a long platform sliding under the read/write head
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Dates and versions

ujm-00358901 , version 1 (05-02-2009)

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E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, et al.. Flying phase mask for the printing of long submicron-period stitchingless gratings. Microelectronic Engineering, 2006, 83 (4-9), pp.734-737. ⟨10.1016/j.mee.2006.01.002⟩. ⟨ujm-00358901⟩
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