Flying phase mask for the printing of long submicron-period stitchingless gratings

E. Gamet 1 Y. Jourlin 1 S. Pelissier 1 R. Min 1 S. Reynaud 1 C. Veillas 1 J.-C. Pommier 1 O. Parriaux 1
1 LHC - Laboratoire Hubert Curien [Saint Etienne]
Abstract : Long and stitchingless gratings are printed by means of a read/write head comprising a phase mask illuminated by an intensity modulated laser beam and a reference grating displacement sensor which dictates the modulation period real time. A nearly perfect grating copying is achieved by fixing the sensor grating scale and the written grating substrate on a long platform sliding under the read/write head
Keywords : Optical lithography Phase mask Stitching Grating
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UNIV-ST-ETIENNE | LAHC | IOGS | PARISTECH

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E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, et al.. Flying phase mask for the printing of long submicron-period stitchingless gratings. Microelectronic Engineering, Elsevier, 2006, 83 (4-9), pp.734-737. ⟨10.1016/j.mee.2006.01.002⟩. ⟨ujm-00358901⟩

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