Flying phase mask for the printing of long submicron-period stitchingless gratings

E. Gamet (1) , Y. Jourlin (1) , S. Pelissier (1) , R. Min (1) , S. Reynaud (1) , C. Veillas (1) , J.-C. Pommier (1) , O. Parriaux (1)

1 LHC - Laboratoire Hubert Curien [Saint Etienne]

Long and stitchingless gratings are printed by means of a read/write head comprising a phase mask illuminated by an intensity modulated laser beam and a reference grating displacement sensor which dictates the modulation period real time. A nearly perfect grating copying is achieved by fixing the sensor grating scale and the written grating substrate on a long platform sliding under the read/write head

Keywords: Optical lithography; Phase mask; Stitching; Grating

Domains: Physics [physics]; Physics [physics]; Optics [physics.optics]

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, et al.. Flying phase mask for the printing of long submicron-period stitchingless gratings. Microelectronic Engineering, 2006, 83 (4-9), pp.734-737. ⟨10.1016/j.mee.2006.01.002⟩. ⟨ujm-00358901⟩