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https://hal-ujm.archives-ouvertes.fr/ujm-01616582
Submitted on : Friday, October 13, 2017-6:47:10 PM
Last modification on : Friday, March 24, 2023-2:53:05 PM
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- HAL Id : ujm-01616582 , version 1
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Tiantian Zhang, Dmitrii Ivchenko, Gilles Mariaux, Armelle Vardelle, Simon Goutier, et al.. Validity of the continuum approach in the midelling of very low-pressure plasma spraying. ISPC, Montreal, Canada, August 2017, Aug 2017, Montreal, Canada. ⟨ujm-01616582⟩
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