Validity of the continuum approach in the midelling of very low-pressure plasma spraying - Archive ouverte HAL Access content directly
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Validity of the continuum approach in the midelling of very low-pressure plasma spraying

Tiantian Zhang
  • Function : Author
Dmitrii Ivchenko
  • Function : Author
Gilles Mariaux
  • Function : Author
  • PersonId : 925439
Axe 2 : procédés plasmas et lasers
Armelle Vardelle
Axe 2 : procédés plasmas et lasers
Simon Goutier
Axe 2 : procédés plasmas et lasers
CV
Tatiana Itina
Laboratoire Hubert Curien

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Engineering Sciences [physics] Chemical and Process Engineering Engineering Sciences [physics] Physics [physics]

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https://hal-ujm.archives-ouvertes.fr/ujm-01616582

Submitted on : Friday, October 13, 2017-6:47:10 PM

Last modification on : Friday, March 24, 2023-2:53:05 PM

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ujm-01616582 , version 1 (13-10-2017)

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  • HAL Id : ujm-01616582 , version 1

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Tiantian Zhang, Dmitrii Ivchenko, Gilles Mariaux, Armelle Vardelle, Simon Goutier, et al.. Validity of the continuum approach in the midelling of very low-pressure plasma spraying. ISPC, Montreal, Canada, August 2017, Aug 2017, Montreal, Canada. ⟨ujm-01616582⟩

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