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Validity of the continuum approach in the midelling of very low-pressure plasma spraying

Tiantian Zhang Dmitrii Ivchenko Gilles Mariaux 1 Armelle Vardelle 1 Simon Goutier 1 Tatiana Itina 2 
1 SPCTS-AXE2 - Axe 2 : procédés plasmas et lasers
SPCTS - Science des Procédés Céramiques et de Traitements de Surface
2 LHC - Laboratoire Hubert Curien [Saint Etienne]
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Conference papers
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https://hal-ujm.archives-ouvertes.fr/ujm-01616582
Contributor : Tatiana Itina Connect in order to contact the contributor
Submitted on : Friday, October 13, 2017 - 6:47:10 PM
Last modification on : Saturday, June 25, 2022 - 9:10:52 PM

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  • HAL Id : ujm-01616582, version 1

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UNIV-ST-ETIENNE | UNILIM | CNRS | SPCTS | SPCTS-AXE2 | IPAM | INC-CNRS | IRCER | IRCER-AXE2 | UDL | IMPEO

Citation

Tiantian Zhang, Dmitrii Ivchenko, Gilles Mariaux, Armelle Vardelle, Simon Goutier, et al.. Validity of the continuum approach in the midelling of very low-pressure plasma spraying. ISPC, Montreal, Canada, August 2017, Aug 2017, Montreal, Canada. ⟨ujm-01616582⟩

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