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Plasma formation and relaxation dynamics in fused silica driven by femtosecond short-wavelength infrared laser pulses

Abstract : Laser-induced plasma formation and subsequent relaxation in solid dielectrics is the precursor to structural modifications that are accompanied by a permanent alteration of material properties. The decay of the electron-hole plasma through distinct relaxation channels determines the properties of the resulting modification. Based on an experimental arrangement combining a time-resolved transmission measurement with a cross-phase modulation measurement, we isolate the plasma formation and relaxation dynamics in the bulk of amorphous fused silica excited by femtosec-ond short-wavelength infrared (λ = 2100 nm) laser pulses. Whereas the relaxation time of the generated electron-hole plasma was so far assumed to be constant, our findings indicate an intensity-dependent relaxation time. We attribute this intensity dependence to vibrational detrapping of self-trapped excitons.
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https://hal-ujm.archives-ouvertes.fr/ujm-02354599
Contributor : Razvan Stoian <>
Submitted on : Wednesday, November 18, 2020 - 1:17:16 PM
Last modification on : Friday, December 4, 2020 - 9:45:28 AM
Long-term archiving on: : Friday, February 19, 2021 - 7:28:53 PM

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P. Jürgens, M. Vrakking, R. Stoian, A. Mermillod-Blondin. Plasma formation and relaxation dynamics in fused silica driven by femtosecond short-wavelength infrared laser pulses. Applied Physics Letters, American Institute of Physics, 2019, 115 (19), pp.191903. ⟨10.1063/1.5117837⟩. ⟨ujm-02354599⟩

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